Interfacial pattern changes of imprinted multilayered material in milli- and microscales

Kazuhiro Yonekura, Kazuki Tokumaru, Fujio Tsumori

Research output: Contribution to journalArticle

Abstract

Nanoimprint lithography (NIL) is a technique that transfers a mold pattern of nanometer order to the surface of a resist material by heating and pressing. NIL is an excellent technology in terms of high productivity, accuracy, and resolution. Recently, NIL has been applied to the processing of different multilayered materials, in which it is possible to process multiple materials simultaneously. In this processing of multilayered materials, it is possible to form an interfacial pattern between the upper layer and the lower layer simultaneously with patterning on the mold surface. This interface pattern can be controlled by the deformation characteristics, initial thickness, and so forth. In this research, we compared the interfacial pattern changes of imprinted multilayered materials in milli- and microscales. For multilayered imprint using multiple materials, it is important to know the flow of the resist and its dependence on the scale. If there is similarity in the relationship produced by the scale on the imprinted samples, a process design with a number of feedbacks could be realized. It also becomes easier to treat structures in the millimeter scale for the experiment. In this study, we employed micropowder imprint (μPI) for multilayered material imprint. A compound sheet of alumina powder and polymer binder was used for imprint. Two similar experiments in different scales, micro- and millimeter scales, were carried out. Results indicate that the interfacial patterns of micro- and millimeter-scale-imprinted samples are similar.

Original languageEnglish
Article number06HG05
JournalJapanese Journal of Applied Physics
Volume57
Issue number6
DOIs
Publication statusPublished - Jun 1 2018

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microbalances
Nanoimprint lithography
lithography
micrometers
pressing
productivity
Processing
aluminum oxides
Binders
Process design
Alumina
Productivity
Experiments
heating
Feedback
Heating
Powders
polymers
Polymers

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Interfacial pattern changes of imprinted multilayered material in milli- and microscales. / Yonekura, Kazuhiro; Tokumaru, Kazuki; Tsumori, Fujio.

In: Japanese Journal of Applied Physics, Vol. 57, No. 6, 06HG05, 01.06.2018.

Research output: Contribution to journalArticle

@article{5f15c5823a834563a9414509b8b54e9e,
title = "Interfacial pattern changes of imprinted multilayered material in milli- and microscales",
abstract = "Nanoimprint lithography (NIL) is a technique that transfers a mold pattern of nanometer order to the surface of a resist material by heating and pressing. NIL is an excellent technology in terms of high productivity, accuracy, and resolution. Recently, NIL has been applied to the processing of different multilayered materials, in which it is possible to process multiple materials simultaneously. In this processing of multilayered materials, it is possible to form an interfacial pattern between the upper layer and the lower layer simultaneously with patterning on the mold surface. This interface pattern can be controlled by the deformation characteristics, initial thickness, and so forth. In this research, we compared the interfacial pattern changes of imprinted multilayered materials in milli- and microscales. For multilayered imprint using multiple materials, it is important to know the flow of the resist and its dependence on the scale. If there is similarity in the relationship produced by the scale on the imprinted samples, a process design with a number of feedbacks could be realized. It also becomes easier to treat structures in the millimeter scale for the experiment. In this study, we employed micropowder imprint (μPI) for multilayered material imprint. A compound sheet of alumina powder and polymer binder was used for imprint. Two similar experiments in different scales, micro- and millimeter scales, were carried out. Results indicate that the interfacial patterns of micro- and millimeter-scale-imprinted samples are similar.",
author = "Kazuhiro Yonekura and Kazuki Tokumaru and Fujio Tsumori",
year = "2018",
month = "6",
day = "1",
doi = "10.7567/JJAP.57.06HG05",
language = "English",
volume = "57",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Institute of Physics",
number = "6",

}

TY - JOUR

T1 - Interfacial pattern changes of imprinted multilayered material in milli- and microscales

AU - Yonekura, Kazuhiro

AU - Tokumaru, Kazuki

AU - Tsumori, Fujio

PY - 2018/6/1

Y1 - 2018/6/1

N2 - Nanoimprint lithography (NIL) is a technique that transfers a mold pattern of nanometer order to the surface of a resist material by heating and pressing. NIL is an excellent technology in terms of high productivity, accuracy, and resolution. Recently, NIL has been applied to the processing of different multilayered materials, in which it is possible to process multiple materials simultaneously. In this processing of multilayered materials, it is possible to form an interfacial pattern between the upper layer and the lower layer simultaneously with patterning on the mold surface. This interface pattern can be controlled by the deformation characteristics, initial thickness, and so forth. In this research, we compared the interfacial pattern changes of imprinted multilayered materials in milli- and microscales. For multilayered imprint using multiple materials, it is important to know the flow of the resist and its dependence on the scale. If there is similarity in the relationship produced by the scale on the imprinted samples, a process design with a number of feedbacks could be realized. It also becomes easier to treat structures in the millimeter scale for the experiment. In this study, we employed micropowder imprint (μPI) for multilayered material imprint. A compound sheet of alumina powder and polymer binder was used for imprint. Two similar experiments in different scales, micro- and millimeter scales, were carried out. Results indicate that the interfacial patterns of micro- and millimeter-scale-imprinted samples are similar.

AB - Nanoimprint lithography (NIL) is a technique that transfers a mold pattern of nanometer order to the surface of a resist material by heating and pressing. NIL is an excellent technology in terms of high productivity, accuracy, and resolution. Recently, NIL has been applied to the processing of different multilayered materials, in which it is possible to process multiple materials simultaneously. In this processing of multilayered materials, it is possible to form an interfacial pattern between the upper layer and the lower layer simultaneously with patterning on the mold surface. This interface pattern can be controlled by the deformation characteristics, initial thickness, and so forth. In this research, we compared the interfacial pattern changes of imprinted multilayered materials in milli- and microscales. For multilayered imprint using multiple materials, it is important to know the flow of the resist and its dependence on the scale. If there is similarity in the relationship produced by the scale on the imprinted samples, a process design with a number of feedbacks could be realized. It also becomes easier to treat structures in the millimeter scale for the experiment. In this study, we employed micropowder imprint (μPI) for multilayered material imprint. A compound sheet of alumina powder and polymer binder was used for imprint. Two similar experiments in different scales, micro- and millimeter scales, were carried out. Results indicate that the interfacial patterns of micro- and millimeter-scale-imprinted samples are similar.

UR - http://www.scopus.com/inward/record.url?scp=85047916528&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85047916528&partnerID=8YFLogxK

U2 - 10.7567/JJAP.57.06HG05

DO - 10.7567/JJAP.57.06HG05

M3 - Article

VL - 57

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 6

M1 - 06HG05

ER -