Investigation of a step-like output energy decrease observed in an ArF excimer laser for microlithography

Akira Sumitani; Takanobu Ishihara; Teruaki Fukuoka; Kiichiro Uchino

doi:10.1143/JJAP.45.L1030

Investigation of a step-like output energy decrease observed in an ArF excimer laser for microlithography

Akira Sumitani, Takanobu Ishihara, Teruaki Fukuoka, Kiichiro Uchino

Electrical Engineering Sciences

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

A step-like decrease of the output energy of an ArF excimer laser for microlithography has been observed during high-repetition rate and high-power operation. The reason for the step-like energy decrease was traced to oxygen by adding 50ppm of various gas impurities to the laser gas. It is supposed that the energy decrease is caused by laser light absorption due to the oxygen or to some kinds of oxygen compounds because no change was observed in ArF and XeF emission intensities which were monitored as measures of excimer formation, Xe content, and discharge states.

Original language	English
Pages (from-to)	L1030-L1032
Journal	Japanese Journal of Applied Physics, Part 2: Letters
Volume	45
Issue number	37-41
DOIs	https://doi.org/10.1143/JJAP.45.L1030
Publication status	Published - Oct 2006

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy (miscellaneous)
Physics and Astronomy(all)

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title = "Investigation of a step-like output energy decrease observed in an ArF excimer laser for microlithography",

abstract = "A step-like decrease of the output energy of an ArF excimer laser for microlithography has been observed during high-repetition rate and high-power operation. The reason for the step-like energy decrease was traced to oxygen by adding 50ppm of various gas impurities to the laser gas. It is supposed that the energy decrease is caused by laser light absorption due to the oxygen or to some kinds of oxygen compounds because no change was observed in ArF and XeF emission intensities which were monitored as measures of excimer formation, Xe content, and discharge states.",

author = "Akira Sumitani and Takanobu Ishihara and Teruaki Fukuoka and Kiichiro Uchino",

year = "2006",

month = oct,

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language = "English",

volume = "45",

pages = "L1030--L1032",

journal = "Japanese Journal of Applied Physics, Part 2: Letters",

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T1 - Investigation of a step-like output energy decrease observed in an ArF excimer laser for microlithography

AU - Sumitani, Akira

AU - Ishihara, Takanobu

AU - Fukuoka, Teruaki

AU - Uchino, Kiichiro

PY - 2006/10

Y1 - 2006/10

N2 - A step-like decrease of the output energy of an ArF excimer laser for microlithography has been observed during high-repetition rate and high-power operation. The reason for the step-like energy decrease was traced to oxygen by adding 50ppm of various gas impurities to the laser gas. It is supposed that the energy decrease is caused by laser light absorption due to the oxygen or to some kinds of oxygen compounds because no change was observed in ArF and XeF emission intensities which were monitored as measures of excimer formation, Xe content, and discharge states.

AB - A step-like decrease of the output energy of an ArF excimer laser for microlithography has been observed during high-repetition rate and high-power operation. The reason for the step-like energy decrease was traced to oxygen by adding 50ppm of various gas impurities to the laser gas. It is supposed that the energy decrease is caused by laser light absorption due to the oxygen or to some kinds of oxygen compounds because no change was observed in ArF and XeF emission intensities which were monitored as measures of excimer formation, Xe content, and discharge states.

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JO - Japanese Journal of Applied Physics, Part 2: Letters

JF - Japanese Journal of Applied Physics, Part 2: Letters

SN - 0021-4922

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