Investigation on microstructures and growth mechanism of Y123 films deposited by advanced TFA-MOD method

J. S. Matsuda, Y. Tokunaga, R. Teranishi, H. Fuji, A. Kaneko, S. Asada, T. Honjo, A. Yajima, Y. Iijima, T. Saitoh, T. Izumi, Y. Shiohara

Research output: Contribution to journalConference article

Abstract

The microstructures and growth mechanism of Y123 films deposited by advanced metalorganic deposition using trifluoroacetates (TFA-MOD) method were investigated. The relationship of water partial pressure (PH2O) and microstructures of Y123 films, deposited by advanced TFA-MOD method, was studied to understand the mechanism of the microstructure evolution and to attain higher critical current (Ic). It was found that the growth rate of Y123 film is proportional to a square root of the PH2O in the crystallization process. The results show that after optimizing the time according to the relationship, the Ic has a dependency on PH 2O; Ic values become higher as PH2O increases.

Original languageEnglish
Article numberEE1.6
Pages (from-to)17-19
Number of pages3
JournalMaterials Research Society Symposium Proceedings
VolumeEXS
Issue number3
Publication statusPublished - Dec 1 2004
Externally publishedYes
Event2003 MRS Fall Meeting - Boston, MA, United States
Duration: Dec 1 2003Dec 4 2003

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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    Matsuda, J. S., Tokunaga, Y., Teranishi, R., Fuji, H., Kaneko, A., Asada, S., Honjo, T., Yajima, A., Iijima, Y., Saitoh, T., Izumi, T., & Shiohara, Y. (2004). Investigation on microstructures and growth mechanism of Y123 films deposited by advanced TFA-MOD method. Materials Research Society Symposium Proceedings, EXS(3), 17-19. [EE1.6].