Ion channeling study of epitaxy of iron based Heusler alloy films on Ge(111)

Yoshihito Maeda, Kazumasa Narumi, Seiji Sakai, Yoshikazu Terai, Kohei Hamaya, Taizoh Sadoh, Masanobu Miyao

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

We have investigated perfection of atomic rows on iron-based Heusler alloy films on Ge(111) planes by using ion channeling technique in order to find the dominant factors for the perfection. Fe3Si/Ge(111) and Fe 2CoSi/Ge(111) have a high quality of atomic rows at the heterointerface like that of perfect crystals. Fe3-xMn xSi/Ge(111) (x = 0.84, 0.72 and 0.36) interfaces have imperfection of atomic rows which may be controlled by both the lattice mismatch with the Ge substrate and the Mn-Si pairs due to the site disorder in the film with the Mn content x > 0.75. Analysis of axial channeling parameters employed in this study is very useful for quantitative evaluation of perfection of atomic rows at the heterointerface.

Original languageEnglish
Pages (from-to)8461-8467
Number of pages7
JournalThin Solid Films
Volume519
Issue number24
DOIs
Publication statusPublished - Oct 3 2011

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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