Ion Source and Stripper Gas Cell Developments for the 6 MeV Tandem Heavy Ion Beam Probe on the Large Helical Device

A. Taniike, M. Sasao, A. Fujisawa, H. Iguchi, Y. Hamada, J. Fujita, M. Wada, Y. Mori

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The feasibility of a heavy ion beam with a tandem acceleration system for plasma potential measurement has been examined. A plasma-sputter-type ion source which produces an Au-beam with an energy width as small as 6 eV and a reasonably small emittance of π mm-mrad (MeV)1/2, can be used for this purpose. Suitable target gas thickness for a charge exchange is estimated to be less than 1015atom/cm2at the 3 MV terminal voltage.

Original languageEnglish
Pages (from-to)430-434
Number of pages5
JournalIEEE Transactions on Plasma Science
Issue number4
Publication statusPublished - Aug 1994
Externally publishedYes


All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Condensed Matter Physics

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