TY - JOUR
T1 - IR absorption spectroscopy of deposition process of amorphous carbon film due to ethylene plasma
AU - Shinohara, Masanori
AU - Tominaga, Taisuke
AU - Shimomura, Hayato
AU - Ihara, Takeshi
AU - Yagyu, Yoshihito
AU - Ohshima, Tamiko
AU - Kawasaki, Hiroharu
N1 - Publisher Copyright:
© 2018 The Institute of Electrical Engineers of Japan.
PY - 2018
Y1 - 2018
N2 - Changes in chemical states of amorphous carbon film during ethylene (C2H4) plasma in the floating potential were investigated with multiple-internal-reflection infrared absorption spectroscopy (MIR-IRAS) and deposition rates. IRAS spectra showed the peaks due to the sp3-CHX were observed, but no peaks due to sp2-CHX were observed. The deposition rate due to ethylene plasma were nearly twice as much as that due to methane plasma, in the same way that the number of carbons in an ethylene molecule is twice as that in a methane molecule. It is suggested that the film growth due to ethylene plasma is the same manner of that due to methane plasma; the plasma-generated hydrocarbon species such as C2H3, C2H5, which are generated in ethylene plasma are adsorbed on dangling bonds which are generated by hydrogen abstraction from the deposited film surface. As a result, the deposited film is comprised of sp3-hydrocarbon components.
AB - Changes in chemical states of amorphous carbon film during ethylene (C2H4) plasma in the floating potential were investigated with multiple-internal-reflection infrared absorption spectroscopy (MIR-IRAS) and deposition rates. IRAS spectra showed the peaks due to the sp3-CHX were observed, but no peaks due to sp2-CHX were observed. The deposition rate due to ethylene plasma were nearly twice as much as that due to methane plasma, in the same way that the number of carbons in an ethylene molecule is twice as that in a methane molecule. It is suggested that the film growth due to ethylene plasma is the same manner of that due to methane plasma; the plasma-generated hydrocarbon species such as C2H3, C2H5, which are generated in ethylene plasma are adsorbed on dangling bonds which are generated by hydrogen abstraction from the deposited film surface. As a result, the deposited film is comprised of sp3-hydrocarbon components.
UR - http://www.scopus.com/inward/record.url?scp=85055966524&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85055966524&partnerID=8YFLogxK
U2 - 10.1541/ieejfms.138.544
DO - 10.1541/ieejfms.138.544
M3 - Article
AN - SCOPUS:85055966524
SN - 0385-4205
VL - 138
SP - 544
EP - 550
JO - IEEJ Transactions on Fundamentals and Materials
JF - IEEJ Transactions on Fundamentals and Materials
IS - 11
ER -