Large-aperture focusing of x rays with micropore optics using dry etching of silicon wafers

Yuichiro Ezoe, Teppei Moriyama, Tomohiro Ogawa, Takuya Kakiuchi, Ikuyuki Mitsuishi, Kazuhisa Mitsuda, Tatsuhiko Aoki, Kohei Morishita, Kazuo Nakajima

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

Large-aperture focusing of Al K? 1.49 keV x-ray photons using micropore optics made from a dry-etched 4 in. (100 mm) silicon wafer is demonstrated. Sidewalls of the micropores are smoothed with high-temperature annealing to work as x-ray mirrors. The wafer is bent to a spherical shape to collect parallel x rays into a focus. Our result supports that this new type of optics allows for the manufacturing of ultralight-weight and high-performance x-ray imaging optics with large apertures at low cost.

Original languageEnglish
Pages (from-to)779-781
Number of pages3
JournalOptics Letters
Volume37
Issue number5
DOIs
Publication statusPublished - Mar 1 2012
Externally publishedYes

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apertures
etching
wafers
optics
silicon
x rays
manufacturing
mirrors
annealing
photons

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics

Cite this

Ezoe, Y., Moriyama, T., Ogawa, T., Kakiuchi, T., Mitsuishi, I., Mitsuda, K., ... Nakajima, K. (2012). Large-aperture focusing of x rays with micropore optics using dry etching of silicon wafers. Optics Letters, 37(5), 779-781. https://doi.org/10.1364/OL.37.000779

Large-aperture focusing of x rays with micropore optics using dry etching of silicon wafers. / Ezoe, Yuichiro; Moriyama, Teppei; Ogawa, Tomohiro; Kakiuchi, Takuya; Mitsuishi, Ikuyuki; Mitsuda, Kazuhisa; Aoki, Tatsuhiko; Morishita, Kohei; Nakajima, Kazuo.

In: Optics Letters, Vol. 37, No. 5, 01.03.2012, p. 779-781.

Research output: Contribution to journalArticle

Ezoe, Y, Moriyama, T, Ogawa, T, Kakiuchi, T, Mitsuishi, I, Mitsuda, K, Aoki, T, Morishita, K & Nakajima, K 2012, 'Large-aperture focusing of x rays with micropore optics using dry etching of silicon wafers', Optics Letters, vol. 37, no. 5, pp. 779-781. https://doi.org/10.1364/OL.37.000779
Ezoe Y, Moriyama T, Ogawa T, Kakiuchi T, Mitsuishi I, Mitsuda K et al. Large-aperture focusing of x rays with micropore optics using dry etching of silicon wafers. Optics Letters. 2012 Mar 1;37(5):779-781. https://doi.org/10.1364/OL.37.000779
Ezoe, Yuichiro ; Moriyama, Teppei ; Ogawa, Tomohiro ; Kakiuchi, Takuya ; Mitsuishi, Ikuyuki ; Mitsuda, Kazuhisa ; Aoki, Tatsuhiko ; Morishita, Kohei ; Nakajima, Kazuo. / Large-aperture focusing of x rays with micropore optics using dry etching of silicon wafers. In: Optics Letters. 2012 ; Vol. 37, No. 5. pp. 779-781.
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