Large-aperture focusing of x rays with micropore optics using dry etching of silicon wafers

Yuichiro Ezoe, Teppei Moriyama, Tomohiro Ogawa, Takuya Kakiuchi, Ikuyuki Mitsuishi, Kazuhisa Mitsuda, Tatsuhiko Aoki, Kohei Morishita, Kazuo Nakajima

Research output: Contribution to journalArticlepeer-review

20 Citations (Scopus)

Abstract

Large-aperture focusing of Al K? 1.49 keV x-ray photons using micropore optics made from a dry-etched 4 in. (100 mm) silicon wafer is demonstrated. Sidewalls of the micropores are smoothed with high-temperature annealing to work as x-ray mirrors. The wafer is bent to a spherical shape to collect parallel x rays into a focus. Our result supports that this new type of optics allows for the manufacturing of ultralight-weight and high-performance x-ray imaging optics with large apertures at low cost.

Original languageEnglish
Pages (from-to)779-781
Number of pages3
JournalOptics Letters
Volume37
Issue number5
DOIs
Publication statusPublished - Mar 1 2012
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics

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