Large-area optical coatings with uniform thickness grown by surface chemical reactions for high-power laser applications

Shin Ichi Zaitsu, Shinji Motokoshi, Takahisa Jitsuno, Masahiro Nakatsuka, Tatsuhiko Yamanaka

Research output: Contribution to journalArticle

36 Citations (Scopus)

Abstract

We prepared optical thin films using an atomic layer deposition (ALD) procedure in order to apply this coating method to optical components for high-power and large-scale lasers. Film thickness shows a proportional relationship to the number of operation cycles even in the case of room-temperature growth, and the distribution is uniform with a thickness error of less than 1% over an area of 240 mm diameter. We examined the laser damage thresholds of the films with 1 ns laser pulses at 1.064 μm. The highest thresholds (TiO2: 5 J/cm2, Al2O3:5.2 J/cm2) are obtained in the amorphous films grown at low growth temperatures (25-50°C). Results from the analysis of film structure and composition, and measurement of optical absorption reveal that the decrease in laser damage threshold as the growth temperature rises is caused by the crystallization of films.

Original languageEnglish
Pages (from-to)160-165
Number of pages6
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume41
Issue number1
DOIs
Publication statusPublished - Jan 1 2002
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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