Laser-ablated plasma for deposition of ZnO thin films on various substrates

T. Ohshima, R. K. Thareja, Y. Yamagata, T. Ikegami, K. Ebihara, J. Narayan

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

We report optical and structural properties of ZnO films deposited by pulsed laser deposition technique on (100) n-type silicon and quartz substrates at various pressures of back ground gas. ZnO plasma was created using KrF laser (248 nm) at various pressures of the ambient gas, oxygen. Laser induced plasma at varying fluence on the target was investigated using optical emission spectroscopy and 2-D images of the expanding plumes. X-ray diffraction, atomic force microscopy, and spectro-photometry were used to characterize as grown films.

Original languageEnglish
Pages (from-to)517-523
Number of pages7
JournalScience and Technology of Advanced Materials
Volume2
Issue number3-4
DOIs
Publication statusPublished - Sep 12 2001
Externally publishedYes

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Gases
Plasmas
Thin films
Optical emission spectroscopy
Quartz
Lasers
Spectrophotometry
Silicon
Substrates
Pulsed laser deposition
Structural properties
Atomic force microscopy
Optical properties
Oxygen
X ray diffraction

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

Cite this

Laser-ablated plasma for deposition of ZnO thin films on various substrates. / Ohshima, T.; Thareja, R. K.; Yamagata, Y.; Ikegami, T.; Ebihara, K.; Narayan, J.

In: Science and Technology of Advanced Materials, Vol. 2, No. 3-4, 12.09.2001, p. 517-523.

Research output: Contribution to journalArticle

Ohshima, T. ; Thareja, R. K. ; Yamagata, Y. ; Ikegami, T. ; Ebihara, K. ; Narayan, J. / Laser-ablated plasma for deposition of ZnO thin films on various substrates. In: Science and Technology of Advanced Materials. 2001 ; Vol. 2, No. 3-4. pp. 517-523.
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