Laser-imaging diagnostics of debris behavior from laser-produced tin plasma for EUV light sources

D. Nakamura; H. Tanaka; Y. Hashimoto; K. Tamaru; A. Takahashi; T. Okada

doi:10.1117/12.698790

Laser-imaging diagnostics of debris behavior from laser-produced tin plasma for EUV light sources

D. Nakamura, H. Tanaka, Y. Hashimoto, K. Tamaru, A. Takahashi, T. Okada

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

In the development of extreme ultraviolet (EUV) light source for EUV lithography systems by laser-produced plasma (LPP), reduction of debris emitted from the plasma such as ions, droplets and neutral atoms is one of the most important factors. In our study, we developed a two-dimensional (2D) laser-induced fluorescence (LIF) imaging system for neutral atoms from the plasma and investigated neutral debris behaviors in order to obtain the guideline for the optimization of debris shields. Dependence of atomic emission on a thickness of LPP Sn target film was observed and the distributions of emitted neutral atoms in H₂ gas were measured by 2D LIF system.

Original language	English
Title of host publication	Photon Processing in Microelectronics and Photonics VI
DOIs	https://doi.org/10.1117/12.698790
Publication status	Published - May 18 2007
Event	Photon Processing in Microelectronics and Photonics VI - San Jose, CA, United States Duration: Jan 22 2007 → Jan 25 2007

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	6458
ISSN (Print)	0277-786X

Other

Other	Photon Processing in Microelectronics and Photonics VI
Country/Territory	United States
City	San Jose, CA
Period	1/22/07 → 1/25/07

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.698790

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Nakamura, D., Tanaka, H., Hashimoto, Y., Tamaru, K., Takahashi, A., & Okada, T. (2007). Laser-imaging diagnostics of debris behavior from laser-produced tin plasma for EUV light sources. In Photon Processing in Microelectronics and Photonics VI [645808] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6458). https://doi.org/10.1117/12.698790

Laser-imaging diagnostics of debris behavior from laser-produced tin plasma for EUV light sources. / Nakamura, D.; Tanaka, H.; Hashimoto, Y. et al.

Photon Processing in Microelectronics and Photonics VI. 2007. 645808 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6458).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Nakamura, D, Tanaka, H, Hashimoto, Y, Tamaru, K, Takahashi, A & Okada, T 2007, Laser-imaging diagnostics of debris behavior from laser-produced tin plasma for EUV light sources. in Photon Processing in Microelectronics and Photonics VI., 645808, Proceedings of SPIE - The International Society for Optical Engineering, vol. 6458, Photon Processing in Microelectronics and Photonics VI, San Jose, CA, United States, 1/22/07. https://doi.org/10.1117/12.698790

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AB - In the development of extreme ultraviolet (EUV) light source for EUV lithography systems by laser-produced plasma (LPP), reduction of debris emitted from the plasma such as ions, droplets and neutral atoms is one of the most important factors. In our study, we developed a two-dimensional (2D) laser-induced fluorescence (LIF) imaging system for neutral atoms from the plasma and investigated neutral debris behaviors in order to obtain the guideline for the optimization of debris shields. Dependence of atomic emission on a thickness of LPP Sn target film was observed and the distributions of emitted neutral atoms in H2 gas were measured by 2D LIF system.

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Laser-imaging diagnostics of debris behavior from laser-produced tin plasma for EUV light sources

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