Laser-imaging diagnostics of debris behavior from laser-produced tin plasma for EUV light sources

D. Nakamura, H. Tanaka, Y. Hashimoto, K. Tamaru, A. Takahashi, T. Okada

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In the development of extreme ultraviolet (EUV) light source for EUV lithography systems by laser-produced plasma (LPP), reduction of debris emitted from the plasma such as ions, droplets and neutral atoms is one of the most important factors. In our study, we developed a two-dimensional (2D) laser-induced fluorescence (LIF) imaging system for neutral atoms from the plasma and investigated neutral debris behaviors in order to obtain the guideline for the optimization of debris shields. Dependence of atomic emission on a thickness of LPP Sn target film was observed and the distributions of emitted neutral atoms in H2 gas were measured by 2D LIF system.

Original languageEnglish
Title of host publicationPhoton Processing in Microelectronics and Photonics VI
DOIs
Publication statusPublished - May 18 2007
EventPhoton Processing in Microelectronics and Photonics VI - San Jose, CA, United States
Duration: Jan 22 2007Jan 25 2007

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6458
ISSN (Print)0277-786X

Other

OtherPhoton Processing in Microelectronics and Photonics VI
CountryUnited States
CitySan Jose, CA
Period1/22/071/25/07

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Laser-imaging diagnostics of debris behavior from laser-produced tin plasma for EUV light sources'. Together they form a unique fingerprint.

Cite this