TY - JOUR
T1 - Laser-stimulated scattering microscope study of an ion-implanted silicon surface
AU - Harata, Akira
AU - Shen, Qing
AU - Tanaka, Takayuki
AU - Sawada, Tsuguo
PY - 1993/8
Y1 - 1993/8
N2 - Surface modification of a silicon single crystal induced by argon ion implantation of a light dose condition (300 keV, 1011atoms/cm2) has been investigated using a laser-stimulated scattering microscope, whose operational principle is based on microscopic measurements of transient reflecting gratings (TRGs). One-dimensional distributions of various material parameters, velocity, onset time and attenuation coefficient of surface acoustic waves and parameters relating to thermal diffusion, thermal expansion and optical absorption, are determined by analyzing the TRG responses measured sequentially along a line across the implanted and unimplanted regions. Some theoretical aspects are presented for the empirical equation used in deducing these parameters from the TRG responses. The change in the anisotropic property of the acoustic velocity is also discussed.
AB - Surface modification of a silicon single crystal induced by argon ion implantation of a light dose condition (300 keV, 1011atoms/cm2) has been investigated using a laser-stimulated scattering microscope, whose operational principle is based on microscopic measurements of transient reflecting gratings (TRGs). One-dimensional distributions of various material parameters, velocity, onset time and attenuation coefficient of surface acoustic waves and parameters relating to thermal diffusion, thermal expansion and optical absorption, are determined by analyzing the TRG responses measured sequentially along a line across the implanted and unimplanted regions. Some theoretical aspects are presented for the empirical equation used in deducing these parameters from the TRG responses. The change in the anisotropic property of the acoustic velocity is also discussed.
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U2 - 10.1143/JJAP.32.3633
DO - 10.1143/JJAP.32.3633
M3 - Article
AN - SCOPUS:0027646099
SN - 0021-4922
VL - 32
SP - 3633
EP - 3638
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 8 R
ER -