Latest trends in ultra-precision polishing/chemical mechanical polishing (CMP) (Part 2) - CMP technology and tribo-chemical assisted polishing

Toshiro Doi, Syuhei Kurokawa, Osamu Ohnishi, Tsutomu Yamazaki

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)809-813
Number of pages5
JournalToraibarojisuto/Journal of Japanese Society of Tribologists
Volume55
Issue number11
Publication statusPublished - 2010

All Science Journal Classification (ASJC) codes

  • Mechanical Engineering
  • Mechanics of Materials
  • Materials Chemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

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