Abstract
It was studied how liquid repellent properties can be controlled on the basis of roughness at surfaces. Ultrafine-patterned surfaces were prepared by the photolithography. The surfaces were fully covered with fluoroalkyl silane coupling agent by chemical vapor deposition (CVD) for about two hours. Contact angle to water increased as increasing pitch of the pattern. The relation between water contact angle and pitch was well expressed by the Cassie mode, where assumed that the space between solid surface and water was occupied by air. Contact angle to dodecane was neither in agreement with Wenzel nor Cassie's modes. Instead, in the case of dodecane, both modes should be combined to reproduce the experimental results. Hence, it can be claimed that factors such as increase in surface area and formation of air layer at the interface between liquid and surface are important for excellent liquid repellent properties.
| Original language | English |
|---|---|
| Title of host publication | Polymer Preprints, Japan - 55th SPSJ Annual Meeting |
| Pages | 1264 |
| Number of pages | 1 |
| Volume | 55 |
| Edition | 1 |
| Publication status | Published - 2006 |
| Event | 55th SPSJ Annual Meeting - Nagoya, Japan Duration: May 24 2006 → May 26 2006 |
Other
| Other | 55th SPSJ Annual Meeting |
|---|---|
| Country | Japan |
| City | Nagoya |
| Period | 5/24/06 → 5/26/06 |
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All Science Journal Classification (ASJC) codes
- Engineering(all)
Cite this
Liquid repellent properties of patterned surfaces and their applications to polymeric materials. / Hikita, Masaya; Nakamura, Tetsuya; Tanaka, Keiji; Kajiyama, Tisato; Takahara, Atsushi.
Polymer Preprints, Japan - 55th SPSJ Annual Meeting. Vol. 55 1. ed. 2006. p. 1264.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Liquid repellent properties of patterned surfaces and their applications to polymeric materials
AU - Hikita, Masaya
AU - Nakamura, Tetsuya
AU - Tanaka, Keiji
AU - Kajiyama, Tisato
AU - Takahara, Atsushi
PY - 2006
Y1 - 2006
N2 - It was studied how liquid repellent properties can be controlled on the basis of roughness at surfaces. Ultrafine-patterned surfaces were prepared by the photolithography. The surfaces were fully covered with fluoroalkyl silane coupling agent by chemical vapor deposition (CVD) for about two hours. Contact angle to water increased as increasing pitch of the pattern. The relation between water contact angle and pitch was well expressed by the Cassie mode, where assumed that the space between solid surface and water was occupied by air. Contact angle to dodecane was neither in agreement with Wenzel nor Cassie's modes. Instead, in the case of dodecane, both modes should be combined to reproduce the experimental results. Hence, it can be claimed that factors such as increase in surface area and formation of air layer at the interface between liquid and surface are important for excellent liquid repellent properties.
AB - It was studied how liquid repellent properties can be controlled on the basis of roughness at surfaces. Ultrafine-patterned surfaces were prepared by the photolithography. The surfaces were fully covered with fluoroalkyl silane coupling agent by chemical vapor deposition (CVD) for about two hours. Contact angle to water increased as increasing pitch of the pattern. The relation between water contact angle and pitch was well expressed by the Cassie mode, where assumed that the space between solid surface and water was occupied by air. Contact angle to dodecane was neither in agreement with Wenzel nor Cassie's modes. Instead, in the case of dodecane, both modes should be combined to reproduce the experimental results. Hence, it can be claimed that factors such as increase in surface area and formation of air layer at the interface between liquid and surface are important for excellent liquid repellent properties.
UR - http://www.scopus.com/inward/record.url?scp=33749674172&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=33749674172&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:33749674172
VL - 55
SP - 1264
BT - Polymer Preprints, Japan - 55th SPSJ Annual Meeting
ER -