Local strain evaluation of single crystal Si pillar by micro Raman spectroscopy and photoluminescence

Dong Wang, Hiroshi Nakashima, Masanori Tanaka, Taizoh Sadoh, Masanobu Miyao, Jun Morioka, Tokuhide Kitamura

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Local strain evaluation was performed for single crystal Si pillar (SCSP) by micro Raman spectroscopy and photoluminescence (PL). SCSPs were fabricated by the mesa etching of Si-on-insulator followed by the etching of the buried oxide. The compressive strain was induced to SCSPs by SiN deposition using low-pressure chemical vapor deposition. The strain distribution was clearly observed in the plane of a certain pattern of SCSP. Strain ratio comparison was also performed for SCSPs with different shapes and sizes. Defect-related PL signals were also observed.

Original languageEnglish
Pages (from-to)31-33
Number of pages3
JournalThin Solid Films
Volume517
Issue number1
DOIs
Publication statusPublished - Nov 3 2008

Fingerprint

Raman spectroscopy
Photoluminescence
etching
Single crystals
photoluminescence
evaluation
strain distribution
single crystals
mesas
Etching
low pressure
insulators
vapor deposition
Low pressure chemical vapor deposition
oxides
defects
Oxides
Defects

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Local strain evaluation of single crystal Si pillar by micro Raman spectroscopy and photoluminescence. / Wang, Dong; Nakashima, Hiroshi; Tanaka, Masanori; Sadoh, Taizoh; Miyao, Masanobu; Morioka, Jun; Kitamura, Tokuhide.

In: Thin Solid Films, Vol. 517, No. 1, 03.11.2008, p. 31-33.

Research output: Contribution to journalArticle

Wang, Dong ; Nakashima, Hiroshi ; Tanaka, Masanori ; Sadoh, Taizoh ; Miyao, Masanobu ; Morioka, Jun ; Kitamura, Tokuhide. / Local strain evaluation of single crystal Si pillar by micro Raman spectroscopy and photoluminescence. In: Thin Solid Films. 2008 ; Vol. 517, No. 1. pp. 31-33.
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AU - Morioka, Jun

AU - Kitamura, Tokuhide

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