Low-damage surface modification of polymethylmethacrylate with argon-oxygen mixture plasmas driven by multiple low-inductance antenna units

Yuichi Setsuhara; Ken Cho; Kosuke Takenaka; Masaharu Shiratani; Makoto Sekine; Masaru Hori; Eiji Ikenaga; Shigeaki Zaima

doi:10.1016/j.tsf.2009.11.045

Low-damage surface modification of polymethylmethacrylate with argon-oxygen mixture plasmas driven by multiple low-inductance antenna units

Yuichi Setsuhara, Ken Cho, Kosuke Takenaka, Masaharu Shiratani, Makoto Sekine, Masaru Hori, Eiji Ikenaga, Shigeaki Zaima

Electronic Devices

Research output: Contribution to journal › Article › peer-review

11 Citations (Scopus)

Abstract

Surface modification of polymethylmethacrylate (PMMA) films has been investigated with argon-oxygen mixture plasmas sustained with multiple low-inductance antenna units. PMMA films were exposed to argon-oxygen mixture (20%) plasmas on a water-cooled substrate holder. Average ion energies bombarding onto the PMMA films was estimated to be as low as 6 eV, which was evaluated from the gap between plasma potential and floating potential. The etching depth of PMMA surface increased linearly with increasing plasma-exposure time and the etching rate was 170 nm/min. Surface roughness of PMMA slightly increased from 0.3 nm to 1.4 nm with increasing exposure time. Hard X-ray photoelectron spectroscopy (HXPES) was carried out to examine chemical bonding states of the PMMA surface in deeper regions (about 54 nm) as compared with those observed in shallower regions (27 nm).

Original language	English
Pages (from-to)	3561-3565
Number of pages	5
Journal	Thin Solid Films
Volume	518
Issue number	13
DOIs	https://doi.org/10.1016/j.tsf.2009.11.045
Publication status	Published - Apr 30 2010

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2009.11.045

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Low-damage surface modification of polymethylmethacrylate with argon-oxygen mixture plasmas driven by multiple low-inductance antenna units. / Setsuhara, Yuichi; Cho, Ken; Takenaka, Kosuke; Shiratani, Masaharu; Sekine, Makoto; Hori, Masaru; Ikenaga, Eiji; Zaima, Shigeaki.

In: Thin Solid Films, Vol. 518, No. 13, 30.04.2010, p. 3561-3565.

Research output: Contribution to journal › Article › peer-review

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title = "Low-damage surface modification of polymethylmethacrylate with argon-oxygen mixture plasmas driven by multiple low-inductance antenna units",

abstract = "Surface modification of polymethylmethacrylate (PMMA) films has been investigated with argon-oxygen mixture plasmas sustained with multiple low-inductance antenna units. PMMA films were exposed to argon-oxygen mixture (20%) plasmas on a water-cooled substrate holder. Average ion energies bombarding onto the PMMA films was estimated to be as low as 6 eV, which was evaluated from the gap between plasma potential and floating potential. The etching depth of PMMA surface increased linearly with increasing plasma-exposure time and the etching rate was 170 nm/min. Surface roughness of PMMA slightly increased from 0.3 nm to 1.4 nm with increasing exposure time. Hard X-ray photoelectron spectroscopy (HXPES) was carried out to examine chemical bonding states of the PMMA surface in deeper regions (about 54 nm) as compared with those observed in shallower regions (27 nm).",

author = "Yuichi Setsuhara and Ken Cho and Kosuke Takenaka and Masaharu Shiratani and Makoto Sekine and Masaru Hori and Eiji Ikenaga and Shigeaki Zaima",

note = "Funding Information: This work was supported partly by The Global COE Program “Center of Excellence for Advanced Structural and Functional Materials Design” from the Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan, and Grant-in-Aid for Cooperative Research Project of Nationwide Joint-Use Research Institutes on Development Base of Joining Technology for New Metallic Glasses and Inorganic Materials from MEXT , Japan. The synchrotron radiation experiments were performed at the SPring-8 with the approval of the Japan Synchrotron Radiation Research Institute (JASRI) as Nanotechnology Support Project of the Ministry of Education, Culture, Sports, Science and Technology (Proposal No. 2008B1847/BL47XU ).",

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AU - Sekine, Makoto

AU - Hori, Masaru

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AU - Zaima, Shigeaki

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AB - Surface modification of polymethylmethacrylate (PMMA) films has been investigated with argon-oxygen mixture plasmas sustained with multiple low-inductance antenna units. PMMA films were exposed to argon-oxygen mixture (20%) plasmas on a water-cooled substrate holder. Average ion energies bombarding onto the PMMA films was estimated to be as low as 6 eV, which was evaluated from the gap between plasma potential and floating potential. The etching depth of PMMA surface increased linearly with increasing plasma-exposure time and the etching rate was 170 nm/min. Surface roughness of PMMA slightly increased from 0.3 nm to 1.4 nm with increasing exposure time. Hard X-ray photoelectron spectroscopy (HXPES) was carried out to examine chemical bonding states of the PMMA surface in deeper regions (about 54 nm) as compared with those observed in shallower regions (27 nm).

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Low-damage surface modification of polymethylmethacrylate with argon-oxygen mixture plasmas driven by multiple low-inductance antenna units

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