Low-damage surface modification of polymethylmethacrylate with argon-oxygen mixture plasmas driven by multiple low-inductance antenna units

Yuichi Setsuhara, Ken Cho, Kosuke Takenaka, Masaharu Shiratani, Makoto Sekine, Masaru Hori, Eiji Ikenaga, Shigeaki Zaima

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

Surface modification of polymethylmethacrylate (PMMA) films has been investigated with argon-oxygen mixture plasmas sustained with multiple low-inductance antenna units. PMMA films were exposed to argon-oxygen mixture (20%) plasmas on a water-cooled substrate holder. Average ion energies bombarding onto the PMMA films was estimated to be as low as 6 eV, which was evaluated from the gap between plasma potential and floating potential. The etching depth of PMMA surface increased linearly with increasing plasma-exposure time and the etching rate was 170 nm/min. Surface roughness of PMMA slightly increased from 0.3 nm to 1.4 nm with increasing exposure time. Hard X-ray photoelectron spectroscopy (HXPES) was carried out to examine chemical bonding states of the PMMA surface in deeper regions (about 54 nm) as compared with those observed in shallower regions (27 nm).

Original languageEnglish
Pages (from-to)3561-3565
Number of pages5
JournalThin Solid Films
Volume518
Issue number13
DOIs
Publication statusPublished - Apr 30 2010

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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