Low loss SOI-based high-mesa waveguides fabricated using neutral loop discharge (NLD) plasma etching for compact breath-sensing system

Satoshi Yano, Kosuke Kameyama, Kiichi Hamamoto

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

SOI-based Si/SiO2 high-mesa waveguide has been fabricated by using neutral loop discharge (NLD) plasma etching. Significant loss reduction of about 50%, resulted in 0.3dB/cm propagation loss, has been achieved.

Original languageEnglish
Title of host publicationIntegrated Photonics and Nanophotonics Research and Applications, IPNRA 2007
PublisherOptical Society of America
ISBN (Print)1557528446, 9781557528445
Publication statusPublished - Jan 1 2007
EventIntegrated Photonics and Nanophotonics Research and Applications, IPNRA 2007 - Salt Lake City, UT, United States
Duration: Jul 8 2007Jul 8 2007

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherIntegrated Photonics and Nanophotonics Research and Applications, IPNRA 2007
CountryUnited States
CitySalt Lake City, UT
Period7/8/077/8/07

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All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

Cite this

Yano, S., Kameyama, K., & Hamamoto, K. (2007). Low loss SOI-based high-mesa waveguides fabricated using neutral loop discharge (NLD) plasma etching for compact breath-sensing system. In Integrated Photonics and Nanophotonics Research and Applications, IPNRA 2007 (Optics InfoBase Conference Papers). Optical Society of America.