Low loss SOI-based high-mesa waveguides fabricated using neutral loop discharge (NLD) plasma etching for compact breath-sensing system

Satoshi Yano, Kosuke Kameyama, Kiichi Hamamoto

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

SOI-based Si/SiO2 high-mesa waveguide has been fabricated by using neutral loop discharge (NLD) plasma etching. Significant loss reduction of about 50%, resulted in 0.3dB/cm propagation loss, has been achieved.

Original languageEnglish
Title of host publicationIntegrated Photonics and Nanophotonics Research and Applications, IPNRA 2007
PublisherOptical Society of America (OSA)
ISBN (Print)1557528446, 9781557528445
DOIs
Publication statusPublished - 2007
EventIntegrated Photonics and Nanophotonics Research and Applications, IPNRA 2007 - Salt Lake City, UT, United States
Duration: Jul 8 2007Jul 8 2007

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherIntegrated Photonics and Nanophotonics Research and Applications, IPNRA 2007
CountryUnited States
CitySalt Lake City, UT
Period7/8/077/8/07

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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