Low-temperature crystallization of amorphous silicon and amorphous germanium by soft X-ray irradiation

Akira Heya, Kazuhiro Kanda, Kaoru Toko, Taizoh Sadoh, Sho Amano, Naoto Matsuo, Shuji Miyamoto, Masanobu Miyao, Takayasu Mochizuki

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Abstract

The low-temperature-crystallization effects of soft X-ray irradiation on the structural properties of amorphous Si and amorphous Ge films were investigated. From the differences in crystallization between Si and Ge, it was found that the effects of soft X-ray irradiation on the crystallization strongly depended on the energy band gap and energy level. The crystallization temperatures of the amorphous Si and amorphous Ge films decreased from 953 K to 853 K and 773 K to 663 K, respectively. The decrease in crystallization temperature was also related to atoms transitioning into a quasi-nucleic phase in the films. The ratio of electron excitation and migration effects to thermal effects was controlled using the storage-ring current (photon flux density). Therefore, we believe that low-temperature crystallization can be realized by controlling atomic migration through electron excitation.

Original languageEnglish
Pages (from-to)334-340
Number of pages7
JournalThin Solid Films
Volume534
DOIs
Publication statusPublished - May 1 2013

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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