Low temperature epitaxial growth of Fe3Si on Si(111) substrate through ultra-thin SiO2 films

Koji Ueda, Mamoru Kumano, Taizoh Sadoh, Masanobu Miyao

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Growth of ferromagnetic silicide Fe3Si on SiO2 was investigated by using the molecular beam deposition technique. Measurements combined with X-ray diffraction and reflective high-energy electron diffraction clearly indicated that poly-crystal Fe3Si layers were formed on Si(111) substrates covered with thick (> 2.7 nm) SiO2 films. On the other hand, it is suggested that Fe3Si layers were epitaxially grown on Si(111) substrates covered with ultra-thin (1.3 nm) SiO2 films. Transmission electron microscopy and electron diffraction measurements confirmed that single crystalline Fe3Si layers with (111) orientation were formed on Si(111) substrates with ultra-thin (1.3 nm) SiO2 films. These results were considered to originate from heteroepitaxy on crystalline ultra-thin SiO2 layer or lateral epitaxial growth over SiO2 through pinholes.

Original languageEnglish
Pages (from-to)425-427
Number of pages3
JournalThin Solid Films
Volume517
Issue number1
DOIs
Publication statusPublished - Nov 3 2008

Fingerprint

Ultrathin films
Epitaxial growth
Substrates
thin films
High energy electron diffraction
Crystalline materials
Molecular beams
electron diffraction
Electron diffraction
Crystal orientation
Temperature
pinholes
diffraction
high energy electrons
molecular beams
Transmission electron microscopy
X ray diffraction
Crystals
transmission electron microscopy
crystals

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Low temperature epitaxial growth of Fe3Si on Si(111) substrate through ultra-thin SiO2 films. / Ueda, Koji; Kumano, Mamoru; Sadoh, Taizoh; Miyao, Masanobu.

In: Thin Solid Films, Vol. 517, No. 1, 03.11.2008, p. 425-427.

Research output: Contribution to journalArticle

Ueda, Koji ; Kumano, Mamoru ; Sadoh, Taizoh ; Miyao, Masanobu. / Low temperature epitaxial growth of Fe3Si on Si(111) substrate through ultra-thin SiO2 films. In: Thin Solid Films. 2008 ; Vol. 517, No. 1. pp. 425-427.
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