Low-temperature fabrication of polycrystalline Si thin film using Al-induced crystallization without native Al oxide at amorphous Si/Al interface

Youhei Sugimoto, Naoki Takata, Takeshi Hirota, Ken Ichi Ikeda, Fuyuki Yoshida, Hideharu Nakashima, Hiroshi Nakashima

Research output: Contribution to journalArticlepeer-review

67 Citations (Scopus)

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Engineering & Materials Science

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