Low-Temperature Growth of Nanocrystalline Diamond by Reactive Pulsed Laser Deposition under a Hydrogen Atmosphere

Tsuyoshi Yoshitake, Takeshi Hara, Tomohito Fukugawa, Ling Yun Zhu, Masaru Itakura, Noriyuki Kuwano, Yoshitsugu Tomokiyo, Kunihito Nagayama

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By reactive pulsed laser deposition under a hydrogen atmosphere, nanocrystalline diamond (NCD) films containing amorphous carbon were grown at a substrate temperature of 550°C. The deposition rate was 80nm/min. The transmission electron microscopy (TEM) observation showed that nonoriented nanocrystalline diamond films, whose crystallite diameters were 10-20nm, were grown at an optimum hydrogen pressure of 4 Torr. The deposited films had smooth surfaces on a nanoscale.

Original languageEnglish
Pages (from-to)L240-L242
JournalJapanese Journal of Applied Physics, Part 2: Letters
Issue number2 B
Publication statusPublished - Feb 15 2004


All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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