Magnetic and Electric Properties of Fe3O4 Thin Films Sputtered on Metallic Underlayer

Fei Qin, Yukio Nozaki, Kimihide Matsuyama

Research output: Contribution to journalArticle

Abstract

High-quality Fe3O4 thin films have been fabricated onto metallic underlayers of Cr/Cu and Al by rf-magnetron sputtering at low substrate temperatures (< 573 K). The measured saturation magnetizations Ms are 462 emu/cm3 for Al (50 nm)/Fe3O 4 (200 nm) and 422 emu/cm3 for Cr (45nm)/Cu (300nm)/Fe3O4 (200nm), which are markedly enhanced compared with that for the reference sample deposited directly on a glass substrate, and practically comparable to the bulk value of 477emu/cm 3. Highly conductive transport with an order-disorder change of the Verwey transition was observed in the current-perpendicular-to-plane geometry. The order of decrease in coercive field was achieved by exchange coupling with an overlaid NiFe layer.

Original languageEnglish
Pages (from-to)189-192
Number of pages4
JournalIEICE Transactions on Electronics
VolumeE87-C
Issue number2
Publication statusPublished - Feb 2004

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Magnetic properties
Electric properties
Thin films
Exchange coupling
Order disorder transitions
Substrates
Saturation magnetization
Magnetron sputtering
Glass
Geometry
Temperature

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

Cite this

Magnetic and Electric Properties of Fe3O4 Thin Films Sputtered on Metallic Underlayer. / Qin, Fei; Nozaki, Yukio; Matsuyama, Kimihide.

In: IEICE Transactions on Electronics, Vol. E87-C, No. 2, 02.2004, p. 189-192.

Research output: Contribution to journalArticle

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