Measurements of SiH4/H2 VHF plasma parameters with heated langmuir probe

T. Yamane; S. Nakao; Y. Takeuchi; H. Muta; R. Ichiki; K. Uchino; Y. Kawai

doi:10.1002/ctpp.201200125

Measurements of SiH₄/H₂ VHF plasma parameters with heated langmuir probe

T. Yamane, S. Nakao, Y. Takeuchi, H. Muta, R. Ichiki, K. Uchino, Y. Kawai

Electrical Engineering Sciences

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

The parameters of a SiH₄/H₂ VHF plasma were measured as a function of silane gas concentration with a heated Langmuir probe. It was found that when the sailane gas concentration is increased, the nagative ion density increases. Here the negative ion density was estimated from the reduction of the electron saturation current. In addition, the dependence of the wall potential on the silane gas concentration agreed with the theoretical values derived from the Bohm sheath equation including negative ions.

Original language	English
Pages (from-to)	588-591
Number of pages	4
Journal	Contributions to Plasma Physics
Volume	53
Issue number	8
DOIs	https://doi.org/10.1002/ctpp.201200125
Publication status	Published - Sept 2013

All Science Journal Classification (ASJC) codes

Condensed Matter Physics

Access to Document

10.1002/ctpp.201200125

Cite this

@article{726b1131b45948f2abb66cd2975f5685,

title = "Measurements of SiH4/H2 VHF plasma parameters with heated langmuir probe",

abstract = "The parameters of a SiH4/H2 VHF plasma were measured as a function of silane gas concentration with a heated Langmuir probe. It was found that when the sailane gas concentration is increased, the nagative ion density increases. Here the negative ion density was estimated from the reduction of the electron saturation current. In addition, the dependence of the wall potential on the silane gas concentration agreed with the theoretical values derived from the Bohm sheath equation including negative ions.",

author = "T. Yamane and S. Nakao and Y. Takeuchi and H. Muta and R. Ichiki and K. Uchino and Y. Kawai",

year = "2013",

month = sep,

doi = "10.1002/ctpp.201200125",

language = "English",

volume = "53",

pages = "588--591",

journal = "Contributions to Plasma Physics",

issn = "0863-1042",

publisher = "Wiley-VCH Verlag",

number = "8",

}

TY - JOUR

T1 - Measurements of SiH4/H2 VHF plasma parameters with heated langmuir probe

AU - Yamane, T.

AU - Nakao, S.

AU - Takeuchi, Y.

AU - Muta, H.

AU - Ichiki, R.

AU - Uchino, K.

AU - Kawai, Y.

PY - 2013/9

Y1 - 2013/9

N2 - The parameters of a SiH4/H2 VHF plasma were measured as a function of silane gas concentration with a heated Langmuir probe. It was found that when the sailane gas concentration is increased, the nagative ion density increases. Here the negative ion density was estimated from the reduction of the electron saturation current. In addition, the dependence of the wall potential on the silane gas concentration agreed with the theoretical values derived from the Bohm sheath equation including negative ions.

AB - The parameters of a SiH4/H2 VHF plasma were measured as a function of silane gas concentration with a heated Langmuir probe. It was found that when the sailane gas concentration is increased, the nagative ion density increases. Here the negative ion density was estimated from the reduction of the electron saturation current. In addition, the dependence of the wall potential on the silane gas concentration agreed with the theoretical values derived from the Bohm sheath equation including negative ions.

UR - http://www.scopus.com/inward/record.url?scp=84884713140&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84884713140&partnerID=8YFLogxK

U2 - 10.1002/ctpp.201200125

DO - 10.1002/ctpp.201200125

M3 - Article

AN - SCOPUS:84884713140

SN - 0863-1042

VL - 53

SP - 588

EP - 591

JO - Contributions to Plasma Physics

JF - Contributions to Plasma Physics

IS - 8

ER -

Measurements of SiH₄/H₂ VHF plasma parameters with heated langmuir probe

Abstract

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this