Measurements of the electron energy distribution function in an Ar/CF4 inductively coupled plasma

M. D. Bowden, R. Tabata, P. Suanpoot, K. Uchino, K. Muraoka, M. Noguchi

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Measurements of the electron energy distribution function (eedf) of a low-pressure inductively coupled plasma operated in a mixture of Ar and CF4 are reported. The measurement method was laser Thomson scattering. Extensive test were performed in order to verify that any perturbations caused by the laser did not affect the measurements. The eedf was measured for different concentrations of CF4 gas, and the results indicated that it was non-Maxwellian when even small amounts of CF4 gas were present. This dependence was attributed partially to the effect of electron-molecule vibrational excitation collisions.

Original languageEnglish
Pages (from-to)2158-2161
Number of pages4
JournalJournal of Applied Physics
Volume90
Issue number5
DOIs
Publication statusPublished - Sep 1 2001

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energy distribution
distribution functions
electron energy
Thomson scattering
gases
lasers
low pressure
perturbation
collisions
excitation
molecules
electrons

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

Measurements of the electron energy distribution function in an Ar/CF4 inductively coupled plasma. / Bowden, M. D.; Tabata, R.; Suanpoot, P.; Uchino, K.; Muraoka, K.; Noguchi, M.

In: Journal of Applied Physics, Vol. 90, No. 5, 01.09.2001, p. 2158-2161.

Research output: Contribution to journalArticle

Bowden, M. D. ; Tabata, R. ; Suanpoot, P. ; Uchino, K. ; Muraoka, K. ; Noguchi, M. / Measurements of the electron energy distribution function in an Ar/CF4 inductively coupled plasma. In: Journal of Applied Physics. 2001 ; Vol. 90, No. 5. pp. 2158-2161.
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