Mechanism and control of sidewall growth and catalyst diffusion on oxide nanowire vapor-liquid-solid growth

Kazuki Nagashima, Takeshi Yanagida, Keisuke Oka, Hidekazu Tanaka, Tomoji Kawai

Research output: Contribution to journalArticle

44 Citations (Scopus)

Abstract

Oxide nanowires formed via the vapor-liquid-solid (VLS) mechanism are attractive building blocks toward nanowire-based electronic devices due to their fascinating physical properties. Although well-defined oxide nanowires are strongly required for the applications, tapering during oxide nanowire VLS growth has been detrimental and uncontrollable. Here we demonstrate the mechanism to control the tapering during oxide VLS growth. Suppressing simultaneously both the oxidization of adatoms at the sidewall and the catalyst diffusion from the tip was found to be essential to avoid the tapering. This mechanism would be universal in various oxide nanowire VLS growths.

Original languageEnglish
Article number153103
JournalApplied Physics Letters
Volume93
Issue number15
DOIs
Publication statusPublished - Oct 24 2008
Externally publishedYes

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nanowires
vapors
catalysts
tapering
oxides
liquids
adatoms
physical properties
electronics

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

Mechanism and control of sidewall growth and catalyst diffusion on oxide nanowire vapor-liquid-solid growth. / Nagashima, Kazuki; Yanagida, Takeshi; Oka, Keisuke; Tanaka, Hidekazu; Kawai, Tomoji.

In: Applied Physics Letters, Vol. 93, No. 15, 153103, 24.10.2008.

Research output: Contribution to journalArticle

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