Mechanism of VHF H2 plasma production at high pressures

Kuan Chen Chen, Kuo Feng Chiu, Chia Fu Chen, Cheng Yang Lien, Yu Jer Tsai, Ting Kuei Lien, Kohei Ogiwara, Kiichiro Uchino, Yoshinobu Kawai

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Abstract

A VHF H2 plasma was produced by a narrow-gap discharge at high pressures, and the plasma parameters were examined with the Langmuir probe. A bi-Maxwellian electron distribution was observed near the discharge electrode at a discharge gap of 10 mm, while a Maxwellian distribution was seen near the center. When the discharge gap was 15 mm, electrons had a Maxwellian distribution independent of the position. It was found that there must be a threshold in the discharge gap for stochastic heating to occur. The plasma potential near the discharge electrode was higher than that near the center of the interelectrode gap, suggesting the existence of negative ions. The simulation using the plasma hybrid code was carried out. The spatial profiles of the density and temperature of electrons were similar to the experimental results. The plasma potential had a hill-like profile that was quite different from the measured one. The negative ion density was negligible.

Original languageEnglish
Article number06HA02
JournalJapanese Journal of Applied Physics
Volume55
Issue number6 S2
DOIs
Publication statusPublished - Jan 1 2016

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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  • Cite this

    Chen, K. C., Chiu, K. F., Chen, C. F., Lien, C. Y., Tsai, Y. J., Lien, T. K., Ogiwara, K., Uchino, K., & Kawai, Y. (2016). Mechanism of VHF H2 plasma production at high pressures. Japanese Journal of Applied Physics, 55(6 S2), [06HA02]. https://doi.org/10.7567/JJAP.55.06HA02