TY - JOUR
T1 - Mechanisms of heat and oxygen transfer in silicon melt in an electromagnetic Czochralski system
AU - Kakimoto, Koichi
AU - Tashiro, Akimasa
AU - Shinozaki, Takashige
AU - Ishii, Hideo
AU - Hashimoto, Yoshio
N1 - Funding Information:
This work was conducted as JSPS Research for the Future Program in the Area of Atomic-Scale Surface and Interface Dynamics. The New Energy and Industrial Technology Development Organization (NEDO) through the Japan Space Utilization Promotion Center (JSUP) supported a part of this work.
PY - 2002
Y1 - 2002
N2 - The three-dimensional time-dependent flow of silicon melt in an electromagnetic Czochralski system was numerically investigated. Two different types of electrodes were used in the mathematical modeling to determine the mechanisms of heat and oxygen transfer in the melt. The results showed that electromagnetic force in the azimuthal direction suppressed natural convection due to centrifugal force. It was also shown that heat and oxygen transfer from a crucible wall to the solid-liquid interface was enhanced due to off-centered vortices.
AB - The three-dimensional time-dependent flow of silicon melt in an electromagnetic Czochralski system was numerically investigated. Two different types of electrodes were used in the mathematical modeling to determine the mechanisms of heat and oxygen transfer in the melt. The results showed that electromagnetic force in the azimuthal direction suppressed natural convection due to centrifugal force. It was also shown that heat and oxygen transfer from a crucible wall to the solid-liquid interface was enhanced due to off-centered vortices.
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U2 - 10.1016/S0022-0248(02)01473-2
DO - 10.1016/S0022-0248(02)01473-2
M3 - Article
AN - SCOPUS:0036071987
VL - 243
SP - 55
EP - 65
JO - Journal of Crystal Growth
JF - Journal of Crystal Growth
SN - 0022-0248
IS - 1
ER -