MEMS-based X-ray optics for future astronomical missions

Yuichiro Ezoe, Ikuyuki Mitsuishi, Kensuke Ishizu, Teppei Moriyama, Kazuhisa Mitsuda, Noriko Y. Yamasaki, Takaya Ohashi, Mitsuhiro Horade, Susumu Sugiyama, Raul E. Riveros, Taylor Boggs, Hitomi Yamaguchi, Yoshiaki Kanamori, Nicholas T. Gabriel, Joseph J. Talghader, Kohei Morishita, Kazuo Nakajima, Ryutaro Maeda

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

X-ray optics based on MEMS technologies can provide future astronomical missions with ultra light-weight and high-performance optical systems. Curvilinear micropores vertical to a thin wafer are made by using DRIE (Deep Reactive Ion Etching) or X-ray LIGA. The side walls are smoothed by using magnetic field assisted finishing and annealing technologies in order that the walls can reflect X-rays. Two or four such wafers are bent to spherical shapes with different curvature of radii and stacked, to focus parallel X-rays from astronomical objects by multiple reflections. In this paper, the concept and recent advances of the MEMS X-ray optics are reviewed.

Original languageEnglish
Title of host publication2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010
Pages191-192
Number of pages2
DOIs
Publication statusPublished - 2010
Externally publishedYes
Event2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010 - Sapporo, Japan
Duration: Aug 9 2010Aug 12 2010

Publication series

Name2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010

Other

Other2010 International Conference on Optical MEMS and Nanophotonics, Optical MEMS and Nanophotonics 2010
CountryJapan
CitySapporo
Period8/9/108/12/10

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

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