Metastable-defect behaviors of iron-boron pairs in silicon

Hiroshi Nakashima, Taizoh Sadoh, T. Tsurushima

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)


Structurally metastable Fei-Bs pairs in silicon have been detected using dark or photo capacitance-transient technique combined with minority-carrier injection below 200 K. Five levels at EC-0.43 eV, 0.46 eV, 0.52 eV, and 0.54 eV and EV+0.53 eV are observed as the metastable defects after the injection. These defects annihilate by annealing at 250 K for a few minutes. The transmutations for respective defects are confirmed by isochronal anneals, and the reaction kinetics are studied by isothermal anneals. From these investigations, the pair configurations responsible for these new defect levels are proposed.

Original languageEnglish
Pages (from-to)1191-1196
Number of pages6
JournalUnknown Journal
Issue numberpt 2
Publication statusPublished - 1994

All Science Journal Classification (ASJC) codes

  • Materials Science(all)


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