Methods of suppressing cluster growth in silane RF discharges

Masaharu Shiratani, S. Maeda, Y. Matsuoka, K. Tanaka, Kazunori Koga, Yukio Watanabe

Research output: Contribution to journalConference article

Abstract

The effects of gas temperature gradient, pulse discharge modulation, hydrogen dilution, gas flow, and substrate materials on growth of clusters below about 10 nm in size in silane parallel-plate RF discharges are studied using a high-sensitivity photon-counting laser-light-scattering (PCLLS) method. Thermophoretic force due to the gas temperature gradient between the electrodes drives neutral clusters above a few nm in size toward the cool RF electrode. Pulse discharge modulation is much more effective in reducing the cluster density when it is combined with the gas temperature gradient, and clusters above a few nm in size cannot be detected by the PCLLS method even for the discharge over a few hours. Hydrogen dilution and gas flow are also effective in suppressing growth of clusters, when the H2/SiH4 concentration ratio is above about 5 and the flow velocity is above about 6 cm/s, respectively. Cluster growth rate with a glass or Si substrate is found to be considerably higher than that without the substrate.

Original languageEnglish
JournalMaterials Research Society Symposium - Proceedings
Volume609
Publication statusPublished - Dec 1 2000
EventAmorphous and Heterogeneus Silicon Thin Films-2000 - San Francisco, CA, United States
Duration: Apr 24 2000Apr 28 2000

Fingerprint

Silanes
silanes
Discharge (fluid mechanics)
Thermal gradients
Gases
Light scattering
Dilution
Flow of gases
Hydrogen
Substrates
Photons
gas temperature
Modulation
temperature gradients
Electrodes
Lasers
Flow velocity
gas flow
dilution
counting

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Methods of suppressing cluster growth in silane RF discharges. / Shiratani, Masaharu; Maeda, S.; Matsuoka, Y.; Tanaka, K.; Koga, Kazunori; Watanabe, Yukio.

In: Materials Research Society Symposium - Proceedings, Vol. 609, 01.12.2000.

Research output: Contribution to journalConference article

@article{380729c7174d4f6baa4cf6dc4371b222,
title = "Methods of suppressing cluster growth in silane RF discharges",
abstract = "The effects of gas temperature gradient, pulse discharge modulation, hydrogen dilution, gas flow, and substrate materials on growth of clusters below about 10 nm in size in silane parallel-plate RF discharges are studied using a high-sensitivity photon-counting laser-light-scattering (PCLLS) method. Thermophoretic force due to the gas temperature gradient between the electrodes drives neutral clusters above a few nm in size toward the cool RF electrode. Pulse discharge modulation is much more effective in reducing the cluster density when it is combined with the gas temperature gradient, and clusters above a few nm in size cannot be detected by the PCLLS method even for the discharge over a few hours. Hydrogen dilution and gas flow are also effective in suppressing growth of clusters, when the H2/SiH4 concentration ratio is above about 5 and the flow velocity is above about 6 cm/s, respectively. Cluster growth rate with a glass or Si substrate is found to be considerably higher than that without the substrate.",
author = "Masaharu Shiratani and S. Maeda and Y. Matsuoka and K. Tanaka and Kazunori Koga and Yukio Watanabe",
year = "2000",
month = "12",
day = "1",
language = "English",
volume = "609",
journal = "Materials Research Society Symposium - Proceedings",
issn = "0272-9172",
publisher = "Materials Research Society",

}

TY - JOUR

T1 - Methods of suppressing cluster growth in silane RF discharges

AU - Shiratani, Masaharu

AU - Maeda, S.

AU - Matsuoka, Y.

AU - Tanaka, K.

AU - Koga, Kazunori

AU - Watanabe, Yukio

PY - 2000/12/1

Y1 - 2000/12/1

N2 - The effects of gas temperature gradient, pulse discharge modulation, hydrogen dilution, gas flow, and substrate materials on growth of clusters below about 10 nm in size in silane parallel-plate RF discharges are studied using a high-sensitivity photon-counting laser-light-scattering (PCLLS) method. Thermophoretic force due to the gas temperature gradient between the electrodes drives neutral clusters above a few nm in size toward the cool RF electrode. Pulse discharge modulation is much more effective in reducing the cluster density when it is combined with the gas temperature gradient, and clusters above a few nm in size cannot be detected by the PCLLS method even for the discharge over a few hours. Hydrogen dilution and gas flow are also effective in suppressing growth of clusters, when the H2/SiH4 concentration ratio is above about 5 and the flow velocity is above about 6 cm/s, respectively. Cluster growth rate with a glass or Si substrate is found to be considerably higher than that without the substrate.

AB - The effects of gas temperature gradient, pulse discharge modulation, hydrogen dilution, gas flow, and substrate materials on growth of clusters below about 10 nm in size in silane parallel-plate RF discharges are studied using a high-sensitivity photon-counting laser-light-scattering (PCLLS) method. Thermophoretic force due to the gas temperature gradient between the electrodes drives neutral clusters above a few nm in size toward the cool RF electrode. Pulse discharge modulation is much more effective in reducing the cluster density when it is combined with the gas temperature gradient, and clusters above a few nm in size cannot be detected by the PCLLS method even for the discharge over a few hours. Hydrogen dilution and gas flow are also effective in suppressing growth of clusters, when the H2/SiH4 concentration ratio is above about 5 and the flow velocity is above about 6 cm/s, respectively. Cluster growth rate with a glass or Si substrate is found to be considerably higher than that without the substrate.

UR - http://www.scopus.com/inward/record.url?scp=0034429770&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0034429770&partnerID=8YFLogxK

M3 - Conference article

VL - 609

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

SN - 0272-9172

ER -