Micromachining of silica glass using EUV radiation of laser-produced plasma

Akihiko Takahashi, Shuichi Torii, Tetsuya Makimura, Kouichi Murakami, Kota Okazaki, Daisuke Nakamura, Tatsuo Okada, Hiroyuki Niino

Research output: Contribution to journalArticlepeer-review

Abstract

We are investigating the micromachining of silica glass using extreme ultraviolet (EUV) light from laser-produced plasma (LPP). The present investigation deals with the ablation using EUV light of around 13.5 nm and 11 nm generated in laser-produced Sn plasma and Xe plasma, respectively. CO 2 laser and Nd:YAG lasers were used as pump lasers. The EUV radiation was focused on the surface of silica glass through the meshed mask using an ellipsoidal mirror coated with gold film. The results showed that the silica glass was successfully ablated by EUV light from the Nd:YAG-LPP. The maximum ablation rate was 42 nm per shot for 11-nm light, and 25 nm per shot for 13.5-nm light. On the other hand, EUV radiation from the CO2-LPP did not ablate the silica glass. This is presumably caused by the lower EUV irradiation intensity due to the long pulse duration of the CO2 laser.

Original languageEnglish
Pages (from-to)1779-1783+12
JournalIEEJ Transactions on Electronics, Information and Systems
Volume130
Issue number10
DOIs
Publication statusPublished - 2010

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

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