Microscopic patterning on the polysilane films by the laser induced grating technique

Koichi Okamoto; Tomoaki Tojo; Hirokazu Tada; Masahide Terazima; Kazumi Matsusige

doi:10.1080/10587250108030110

Microscopic patterning on the polysilane films by the laser induced grating technique

Koichi Okamoto, Tomoaki Tojo, Hirokazu Tada, Masahide Terazima, Kazumi Matsusige

Department of Fundamental Organic Chemistry

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

Microscopic patterning on polysilane thin film was observed after photoexcitation with an optical interference pattern using a nanosecond pulsed laser. The patterning processes were monitored by the diffraction of the probe beam. The observed diffraction signals consist of the transient grating component due to the temperature change and the permanent grating component due to a chemical reaction. It was found that the microscopic pattern was destroyed with prolonged laser radiation. The created microscopic pattern was observed by the optical microscope.

Original language	English
Pages (from-to)	379-382
Number of pages	4
Journal	Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals
Volume	370
DOIs	https://doi.org/10.1080/10587250108030110
Publication status	Published - 2001

All Science Journal Classification (ASJC) codes

Condensed Matter Physics

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10.1080/10587250108030110

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@article{298f52e2842e4370a9e21f1370a41132,

title = "Microscopic patterning on the polysilane films by the laser induced grating technique",

abstract = "Microscopic patterning on polysilane thin film was observed after photoexcitation with an optical interference pattern using a nanosecond pulsed laser. The patterning processes were monitored by the diffraction of the probe beam. The observed diffraction signals consist of the transient grating component due to the temperature change and the permanent grating component due to a chemical reaction. It was found that the microscopic pattern was destroyed with prolonged laser radiation. The created microscopic pattern was observed by the optical microscope.",

author = "Koichi Okamoto and Tomoaki Tojo and Hirokazu Tada and Masahide Terazima and Kazumi Matsusige",

note = "Funding Information: The Authors would like to thank Prof. Sigeo Fujita and Prof. Yoichi Kawakami (Kyoto Univ.) for variable suggestion and discussion. This work was partly supported by the Kyoto University-Venture Business Laboratory Project, Research Foundation for Opto-Science and Technology, and Konica Imaging Science.",

year = "2001",

doi = "10.1080/10587250108030110",

language = "English",

volume = "370",

pages = "379--382",

journal = "Molecular Crystals and Liquid Crystals",

issn = "1542-1406",

publisher = "Taylor and Francis Ltd.",

}

TY - JOUR

T1 - Microscopic patterning on the polysilane films by the laser induced grating technique

AU - Okamoto, Koichi

AU - Tojo, Tomoaki

AU - Tada, Hirokazu

AU - Terazima, Masahide

AU - Matsusige, Kazumi

N1 - Funding Information: The Authors would like to thank Prof. Sigeo Fujita and Prof. Yoichi Kawakami (Kyoto Univ.) for variable suggestion and discussion. This work was partly supported by the Kyoto University-Venture Business Laboratory Project, Research Foundation for Opto-Science and Technology, and Konica Imaging Science.

PY - 2001

Y1 - 2001

N2 - Microscopic patterning on polysilane thin film was observed after photoexcitation with an optical interference pattern using a nanosecond pulsed laser. The patterning processes were monitored by the diffraction of the probe beam. The observed diffraction signals consist of the transient grating component due to the temperature change and the permanent grating component due to a chemical reaction. It was found that the microscopic pattern was destroyed with prolonged laser radiation. The created microscopic pattern was observed by the optical microscope.

AB - Microscopic patterning on polysilane thin film was observed after photoexcitation with an optical interference pattern using a nanosecond pulsed laser. The patterning processes were monitored by the diffraction of the probe beam. The observed diffraction signals consist of the transient grating component due to the temperature change and the permanent grating component due to a chemical reaction. It was found that the microscopic pattern was destroyed with prolonged laser radiation. The created microscopic pattern was observed by the optical microscope.

UR - http://www.scopus.com/inward/record.url?scp=31944433153&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=31944433153&partnerID=8YFLogxK

U2 - 10.1080/10587250108030110

DO - 10.1080/10587250108030110

M3 - Article

AN - SCOPUS:31944433153

SN - 1542-1406

VL - 370

SP - 379

EP - 382

JO - Molecular Crystals and Liquid Crystals

JF - Molecular Crystals and Liquid Crystals

ER -

Microscopic patterning on the polysilane films by the laser induced grating technique

Abstract

All Science Journal Classification (ASJC) codes

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