Abstract
Strain in a bridge-shaped freestanding Si membrane (FSSM) induced by depositing an amorphous SixNy layer was measured by convergent-beam electron diffraction (CBED). CBED results show that the strain magnitude depends negatively on the FSSM thickness. FEM is a supplement of the result of CBED due to the relaxation of TEM samples during fabricating. The FEM analysis results ascertain the strain property in three dimensions, and show that the strain magnitude depends negatively on the length of FSSM, and the magnitude of the compressive strain in FSSM increases as the position is closer to the upper Si/SixNy interface.
| Original language | English |
|---|---|
| Pages (from-to) | 6633-6637 |
| Number of pages | 5 |
| Journal | Materials Science and Engineering A |
| Volume | 527 |
| Issue number | 24-25 |
| DOIs | |
| Publication status | Published - Sep 1 2010 |
All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering
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Cite this
Gao, H., Ikeda, K. I., Hata, S., Nakashima, H., Wang, D., & Nakashima, H. (2010). Microstructure and strain distribution in freestanding Si membrane strained by SixNy deposition. Materials Science and Engineering A, 527(24-25), 6633-6637. https://doi.org/10.1016/j.msea.2010.07.004