TY - JOUR
T1 - Microstructure and strain distribution in freestanding Si membrane strained by SixNy deposition
AU - Gao, Hongye
AU - Ikeda, Ken Ichi
AU - Hata, Satoshi
AU - Nakashima, Hideharu
AU - Wang, Dong
AU - Nakashima, Hiroshi
PY - 2010/9
Y1 - 2010/9
N2 - Strain in a bridge-shaped freestanding Si membrane (FSSM) induced by depositing an amorphous SixNy layer was measured by convergent-beam electron diffraction (CBED). CBED results show that the strain magnitude depends negatively on the FSSM thickness. FEM is a supplement of the result of CBED due to the relaxation of TEM samples during fabricating. The FEM analysis results ascertain the strain property in three dimensions, and show that the strain magnitude depends negatively on the length of FSSM, and the magnitude of the compressive strain in FSSM increases as the position is closer to the upper Si/SixNy interface.
AB - Strain in a bridge-shaped freestanding Si membrane (FSSM) induced by depositing an amorphous SixNy layer was measured by convergent-beam electron diffraction (CBED). CBED results show that the strain magnitude depends negatively on the FSSM thickness. FEM is a supplement of the result of CBED due to the relaxation of TEM samples during fabricating. The FEM analysis results ascertain the strain property in three dimensions, and show that the strain magnitude depends negatively on the length of FSSM, and the magnitude of the compressive strain in FSSM increases as the position is closer to the upper Si/SixNy interface.
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U2 - 10.1016/j.msea.2010.07.004
DO - 10.1016/j.msea.2010.07.004
M3 - Article
AN - SCOPUS:77955918290
VL - 527
SP - 6633
EP - 6637
JO - Materials Science & Engineering A: Structural Materials: Properties, Microstructure and Processing
JF - Materials Science & Engineering A: Structural Materials: Properties, Microstructure and Processing
SN - 0921-5093
IS - 24-25
ER -