Molecular aggregation states of silsesquioxane-terminated polystyrene in polystyrene thin film

Kyota Miyamoto, Nao Hosaka, Motoyasu Kobayashi, Hideyuki Otsuka, Naoya Torikai, Atsushi Takahara

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Organic-inorganic hybrid polymers (PS-POSS), which were polystyrene (PS) with polyhedral oligomeric silsesquioxane (POSS) end group, were prepared by nitroxide-mediated radical polymerization. Blend films composed of PS-POSS and PS were spin-coated from their toluene solution onto cleaned silicon wafer. The dispersibility of POSS in PS thin films was improved by the introduction of POSS as the chain end groups of PS. The addition of PS-POSS to PS thin film can stabilize the film against dewetting. Neutron reflectivity measurements revealed that PS-POSS formed enriched layer at the surface and interface of the film. The segregation of the PS-POSS, which changes the surface and interface free energy of the film, can be an important factor in the dewetting inhibition effect.

Original languageEnglish
Title of host publicationPolymer Preprints, Japan - 55th SPSJ Annual Meeting
Pages1228
Number of pages1
Volume55
Edition1
Publication statusPublished - 2006
Event55th SPSJ Annual Meeting - Nagoya, Japan
Duration: May 24 2006May 26 2006

Other

Other55th SPSJ Annual Meeting
CountryJapan
CityNagoya
Period5/24/065/26/06

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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    Miyamoto, K., Hosaka, N., Kobayashi, M., Otsuka, H., Torikai, N., & Takahara, A. (2006). Molecular aggregation states of silsesquioxane-terminated polystyrene in polystyrene thin film. In Polymer Preprints, Japan - 55th SPSJ Annual Meeting (1 ed., Vol. 55, pp. 1228)