Molecular aggregation structure and properties of silsesquioxane-terminated polystyrene

Kyota Miyamoto, Nao Hosaka, Motoyasu Kobayashi, Hideyuki Otsuka, Naoya Torikai, Atsushi Takahara

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Organic-inorganic hybrid polymers (PS-POSS), which are polystyrene (PS) with polyhedral oligomeric silsesquioxane (POSS) end group, were prepared by nitroxide-mediated radical polymerization. PS-POSS thin films were spin-coated from its toluene solution onto acid-cleaned silicon wafers. After annealing at 393 K for 3 h, PS-POSS (Mn=2500, Mw/Mn=1.11; PS-POSS2.5k) thin film did not dewet at all, in contrast, the bare substrate was observed as a consequence of the complete dewetting of the pure PS (M n=2100, Mw/Mn=1.06; PS2.1k) film. Differential scanning calorimetric analysis showed that the glass transition temperature of PS-POSS2.5k was 348.1 K, which means a noticeable increase from that of PS2.1k. Rheological characterization of PS-POSS2.5k suggested that the introduction of POSS as the chain end group of PS delays the dynamics of the polymer chain in melt state. Furthermore, neutron reflectivity measurement revealed that the POSS moiety of PS-POSS formed enriched layer at the surface and interface of the film. The segregation of POSS, which changes the surface and interface free energy of the film, can be an important factor in the dewetting inhibition effect.

Original languageEnglish
Title of host publication55th SPSJ Symposium on Macromolecules
Pages5167-5168
Number of pages2
Volume55
Edition2
Publication statusPublished - 2006
Event55th Society of Polymer Science Japan Symposium on Macromolecules - Toyama, Japan
Duration: Sep 20 2006Sep 22 2006

Other

Other55th Society of Polymer Science Japan Symposium on Macromolecules
CountryJapan
CityToyama
Period9/20/069/22/06

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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