Molecular dynamics studies of surface nucleation and crystal growth of SI on SIO2 substrates

Byoung Min Lee, Hong Koo Baik, T. Kuranaga, S. Munetoh, T. Motooka

    Research output: Contribution to journalConference articlepeer-review

    Abstract

    Molecular dynamics (MD) simulations of atomistic processes of nucleation and crystal growth of silicon (Si) on SiO2 substrate have been performed using the Tersoff potential based on a combination of Langevin and Newton equations. A new set of potential parameters was used to calculate the interatomic forces of Si and oxygen (O) atoms. It was found that the (111) plane of the Si nuclei formed at the surface was predominantly parallel to the surface of MD cell. The values of surface energy for (100), (110), and (111) planes of Si at 77 K were calculated to be 2.27, 1.52, and 1.20 J/m2, respectively. This result suggests that, the nucleation leads to a preferred (111) orientation in the poly-Si thin film at the surface, driven by the lower surface energy.

    Original languageEnglish
    Pages (from-to)99-104
    Number of pages6
    JournalMaterials Research Society Symposium Proceedings
    Volume899
    DOIs
    Publication statusPublished - Jan 1 2005
    Event2005 MRS Fall Meeting - Boston, MA, United States
    Duration: Nov 28 2005Dec 2 2005

    All Science Journal Classification (ASJC) codes

    • Materials Science(all)
    • Condensed Matter Physics
    • Mechanics of Materials
    • Mechanical Engineering

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