Molecular dynamics study of velocity distribution and local temperature change during rapid cooling processes in excimer-laser annealed silicon

Byoung Min Lee, Shinji Munetoh, Teruaki Motooka

    Research output: Contribution to journalArticlepeer-review

    15 Citations (Scopus)

    Abstract

    Molecular dynamics (MD) simulations have been performed to investigate velocity distribution of atoms and local temperature changes during rapid cooling processes in excimer-laser annealed Si. The interatomic forces were calculated using the Tersoff potential, and the rapid cooling processes were simulated by determining the atomic movements with a combination of Langevin and Newton equations using a MD cell with the size of 48.9 × 48.9 × 97.8 Å3. The local velocity distribution during rapid cooling processes was found to be the Maxwell-Boltzmann type, and the steady-state temperature distribution was obtained within 100 ps.

    Original languageEnglish
    Pages (from-to)198-202
    Number of pages5
    JournalComputational Materials Science
    Volume37
    Issue number3
    DOIs
    Publication statusPublished - Sep 1 2006

    All Science Journal Classification (ASJC) codes

    • Computer Science(all)
    • Chemistry(all)
    • Materials Science(all)
    • Mechanics of Materials
    • Physics and Astronomy(all)
    • Computational Mathematics

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