Monolayer resist for patterned contact printing of aligned nanowire arrays

Toshitake Takahashi, Kuniharu Takei, Johnny C. Ho, Yu Lun Chueh, Zhiyong Fan, Ali Javey

Research output: Contribution to journalArticlepeer-review

Abstract

Large-area, patterned printing of nanowires by using fluorinated self-assembled monolayers as the resist layer is demonstrated. By projecting a light pattern on the surface of the monolayer resist in an oxygen-rich environment, sticky and nonsticky regions on the surface are directly defined in a single-step process which then enables the highly specific and patterned transfer of the nanowires by the contact printing process, without the need for a subsequent lift-off step. This work demonstrates a simple route toward scalable, patterned printing of nanowires on substrates by utilizing light-tunable, nanoscale chemical interactions and demonstrates the versatility of molecular monolayers for use as a resist layer.

Original languageEnglish
Pages (from-to)2102-2103
Number of pages2
JournalJournal of the American Chemical Society
Volume131
Issue number6
DOIs
Publication statusPublished - Feb 18 2009
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Catalysis
  • Chemistry(all)
  • Biochemistry
  • Colloid and Surface Chemistry

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