Multistep thickening of nafion thin films in water

Yudai Ogata, Daisuke Kawaguchi, Norifumi L. Yamada, Keiji Tanaka

Research output: Contribution to journalArticle

28 Citations (Scopus)

Abstract

Water sorption kinetics in thin Nafion films prepared on silver and silicon oxide substrates was examined by surface plasmon resonance and neutron reflectivity measurements. It was found that the films thickened in three regimes. The asymptotic swelling ratios in regimes I, II, and III were 1.05, 1.26, and 1.41, respectively. These values were independent of the substrate species and were coincident with the transition points of different hydration states in the bulk Nafion; water binding to sulfonic acid groups, the formation of sphere-like ionic clusters, and bridge formation between clusters. The swelling was much slower in thin films than in the bulk due to the mobility restriction of Nafion near the substrate.

Original languageEnglish
Pages (from-to)856-859
Number of pages4
JournalACS Macro Letters
Volume2
Issue number10
DOIs
Publication statusPublished - Oct 28 2013

Fingerprint

Thin films
Swelling
Water
Substrates
Silver oxides
Sulfonic Acids
Silicon oxides
Surface plasmon resonance
Hydration
Sorption
Neutrons
Kinetics
Acids
perfluorosulfonic acid

All Science Journal Classification (ASJC) codes

  • Organic Chemistry
  • Polymers and Plastics
  • Inorganic Chemistry
  • Materials Chemistry

Cite this

Multistep thickening of nafion thin films in water. / Ogata, Yudai; Kawaguchi, Daisuke; Yamada, Norifumi L.; Tanaka, Keiji.

In: ACS Macro Letters, Vol. 2, No. 10, 28.10.2013, p. 856-859.

Research output: Contribution to journalArticle

Ogata, Yudai ; Kawaguchi, Daisuke ; Yamada, Norifumi L. ; Tanaka, Keiji. / Multistep thickening of nafion thin films in water. In: ACS Macro Letters. 2013 ; Vol. 2, No. 10. pp. 856-859.
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