Nanocrystalline diamond film prepared by pulsed laser deposition in a hydrogen atmosphere

Takeshi Hara, Tsuyoshi Yoshitake, Tomohito Fukugawa, Ling yun Zhu, Masaru Itakura, Noriyuki Kuwano, Yoshitsugu Tomokiyo, Kunihito Nagayama

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

Nanocrystalline diamond films were grown in a hydrogen atmosphere by pulsed laser deposition (PLD). The transmission electron microscopy indicated the presence of non-oriented nanocrystalline diamond films, with crystallite diameters 10-20 nm, grown at an optimum hydrogen pressure of 4 Torr. A small amount of amorphous carbon was observed to have remained in the film. The typical deposition rate was 80 nm/min. The substrate temperature for the growth was 550 °C, which is lower by 150 °C than that of the conventional chemical vapor deposition. The deposited film had a smooth surface on the nanoscale.

Original languageEnglish
Pages (from-to)679-683
Number of pages5
JournalDiamond and Related Materials
Volume13
Issue number4-8
DOIs
Publication statusPublished - Apr 1 2004

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

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