Abstract
We have developed nanoimprint technology to fabricate functional optical components. The future and usage of various molds for nanoimprint are described and their patterning examples are shown. Several applications of the nanoimprint technology are introduced; anti-reflection surface structure by using graded convex and concave patterns, extremely low threshold dye laser by 2-dimensional photonic crystals infiltrated with a gain medium, and various semiconductor nanostructures being used for functional optical devices. Nanoimprint is key technology to realize these components.
| Original language | English |
|---|---|
| Article number | 605001 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 6050 |
| DOIs | |
| Publication status | Published - Dec 1 2005 |
| Externally published | Yes |
| Event | Optomechatronic Micro/Nano Devices and Components - Sappora, Japan Duration: Dec 5 2005 → Dec 7 2005 |
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All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering
Cite this
Nanoimprint technology for application to photonic devices. / Nakao, Masashi; Yokoyama, Shiyoshi; Masuda, Hideki.
In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 6050, 605001, 01.12.2005.Research output: Contribution to journal › Conference article
}
TY - JOUR
T1 - Nanoimprint technology for application to photonic devices
AU - Nakao, Masashi
AU - Yokoyama, Shiyoshi
AU - Masuda, Hideki
PY - 2005/12/1
Y1 - 2005/12/1
N2 - We have developed nanoimprint technology to fabricate functional optical components. The future and usage of various molds for nanoimprint are described and their patterning examples are shown. Several applications of the nanoimprint technology are introduced; anti-reflection surface structure by using graded convex and concave patterns, extremely low threshold dye laser by 2-dimensional photonic crystals infiltrated with a gain medium, and various semiconductor nanostructures being used for functional optical devices. Nanoimprint is key technology to realize these components.
AB - We have developed nanoimprint technology to fabricate functional optical components. The future and usage of various molds for nanoimprint are described and their patterning examples are shown. Several applications of the nanoimprint technology are introduced; anti-reflection surface structure by using graded convex and concave patterns, extremely low threshold dye laser by 2-dimensional photonic crystals infiltrated with a gain medium, and various semiconductor nanostructures being used for functional optical devices. Nanoimprint is key technology to realize these components.
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UR - http://www.scopus.com/inward/citedby.url?scp=33645094673&partnerID=8YFLogxK
U2 - 10.1117/12.649216
DO - 10.1117/12.649216
M3 - Conference article
AN - SCOPUS:33645094673
VL - 6050
JO - Proceedings of SPIE - The International Society for Optical Engineering
JF - Proceedings of SPIE - The International Society for Optical Engineering
SN - 0277-786X
M1 - 605001
ER -