Nanoimprint technology for application to photonic devices

Masashi Nakao; Shiyoshi Yokoyama; Hideki Masuda

doi:10.1117/12.649216

Nanoimprint technology for application to photonic devices

Masashi Nakao, Shiyoshi Yokoyama, Hideki Masuda

Research output: Contribution to journal › Conference article › peer-review

Abstract

We have developed nanoimprint technology to fabricate functional optical components. The future and usage of various molds for nanoimprint are described and their patterning examples are shown. Several applications of the nanoimprint technology are introduced; anti-reflection surface structure by using graded convex and concave patterns, extremely low threshold dye laser by 2-dimensional photonic crystals infiltrated with a gain medium, and various semiconductor nanostructures being used for functional optical devices. Nanoimprint is key technology to realize these components.

Original language	English
Article number	605001
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	6050
DOIs	https://doi.org/10.1117/12.649216
Publication status	Published - Dec 1 2005
Externally published	Yes
Event	Optomechatronic Micro/Nano Devices and Components - Sappora, Japan Duration: Dec 5 2005 → Dec 7 2005

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.649216

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title = "Nanoimprint technology for application to photonic devices",

abstract = "We have developed nanoimprint technology to fabricate functional optical components. The future and usage of various molds for nanoimprint are described and their patterning examples are shown. Several applications of the nanoimprint technology are introduced; anti-reflection surface structure by using graded convex and concave patterns, extremely low threshold dye laser by 2-dimensional photonic crystals infiltrated with a gain medium, and various semiconductor nanostructures being used for functional optical devices. Nanoimprint is key technology to realize these components.",

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AU - Nakao, Masashi

AU - Yokoyama, Shiyoshi

AU - Masuda, Hideki

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N2 - We have developed nanoimprint technology to fabricate functional optical components. The future and usage of various molds for nanoimprint are described and their patterning examples are shown. Several applications of the nanoimprint technology are introduced; anti-reflection surface structure by using graded convex and concave patterns, extremely low threshold dye laser by 2-dimensional photonic crystals infiltrated with a gain medium, and various semiconductor nanostructures being used for functional optical devices. Nanoimprint is key technology to realize these components.

AB - We have developed nanoimprint technology to fabricate functional optical components. The future and usage of various molds for nanoimprint are described and their patterning examples are shown. Several applications of the nanoimprint technology are introduced; anti-reflection surface structure by using graded convex and concave patterns, extremely low threshold dye laser by 2-dimensional photonic crystals infiltrated with a gain medium, and various semiconductor nanostructures being used for functional optical devices. Nanoimprint is key technology to realize these components.

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JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

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T2 - Optomechatronic Micro/Nano Devices and Components

Y2 - 5 December 2005 through 7 December 2005

ER -

Nanoimprint technology for application to photonic devices

Abstract

All Science Journal Classification (ASJC) codes

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