Nanoscale molecular patterning on artificially fabricated nanoscale structured Al surfaces

H. Kato, S. Takemura, S. Kimura, T. Okumura, D. Kobayakawa, Y. Watanabe, Takeharu Sugiyama, T. Hiramatsu, N. Nanba, O. Nishikawa, M. Taniguchi

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The surface of an Al plate was treated with a combination of chemical and electrochemical processes for fabrication of surface nanoscale structures on Al plates. Chemical treatments by using acetone and pure water under supersonic waves were conducted on an Al surface. Additional electrochemical process in H 2 SO 4 solution created a finer and oriented nanoscale structure on the Al surface. DFM measurement clarified that the nanoscale highly oriented line-structure was successfully created on Al surface. The line distance was estimated approximately 30-40 nm. Molecular patterning on the highly oriented line-structure by copper phthalocyanine (CuPc) was also conducted. The CuPc molecules were put on the nanoscale structure by casting a toluene droplet containing CuPc. DFM and X-ray photoemission spectroscopy (XPS) measurements demonstrated that a molecular pattern that the groove channels were filled with CuPc molecules was fabricated.

Original languageEnglish
Article number052018
JournalJournal of Physics: Conference Series
Volume100
Issue numberPART 5
DOIs
Publication statusPublished - Mar 1 2008
Externally publishedYes

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grooves
acetone
toluene
molecules
photoelectric emission
copper
fabrication
water
spectroscopy
x rays

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

Kato, H., Takemura, S., Kimura, S., Okumura, T., Kobayakawa, D., Watanabe, Y., ... Taniguchi, M. (2008). Nanoscale molecular patterning on artificially fabricated nanoscale structured Al surfaces. Journal of Physics: Conference Series, 100(PART 5), [052018]. https://doi.org/10.1088/1742-6596/100/5/052018

Nanoscale molecular patterning on artificially fabricated nanoscale structured Al surfaces. / Kato, H.; Takemura, S.; Kimura, S.; Okumura, T.; Kobayakawa, D.; Watanabe, Y.; Sugiyama, Takeharu; Hiramatsu, T.; Nanba, N.; Nishikawa, O.; Taniguchi, M.

In: Journal of Physics: Conference Series, Vol. 100, No. PART 5, 052018, 01.03.2008.

Research output: Contribution to journalArticle

Kato, H, Takemura, S, Kimura, S, Okumura, T, Kobayakawa, D, Watanabe, Y, Sugiyama, T, Hiramatsu, T, Nanba, N, Nishikawa, O & Taniguchi, M 2008, 'Nanoscale molecular patterning on artificially fabricated nanoscale structured Al surfaces', Journal of Physics: Conference Series, vol. 100, no. PART 5, 052018. https://doi.org/10.1088/1742-6596/100/5/052018
Kato, H. ; Takemura, S. ; Kimura, S. ; Okumura, T. ; Kobayakawa, D. ; Watanabe, Y. ; Sugiyama, Takeharu ; Hiramatsu, T. ; Nanba, N. ; Nishikawa, O. ; Taniguchi, M. / Nanoscale molecular patterning on artificially fabricated nanoscale structured Al surfaces. In: Journal of Physics: Conference Series. 2008 ; Vol. 100, No. PART 5.
@article{9d1cb8f217354297b802ce0e17a50479,
title = "Nanoscale molecular patterning on artificially fabricated nanoscale structured Al surfaces",
abstract = "The surface of an Al plate was treated with a combination of chemical and electrochemical processes for fabrication of surface nanoscale structures on Al plates. Chemical treatments by using acetone and pure water under supersonic waves were conducted on an Al surface. Additional electrochemical process in H 2 SO 4 solution created a finer and oriented nanoscale structure on the Al surface. DFM measurement clarified that the nanoscale highly oriented line-structure was successfully created on Al surface. The line distance was estimated approximately 30-40 nm. Molecular patterning on the highly oriented line-structure by copper phthalocyanine (CuPc) was also conducted. The CuPc molecules were put on the nanoscale structure by casting a toluene droplet containing CuPc. DFM and X-ray photoemission spectroscopy (XPS) measurements demonstrated that a molecular pattern that the groove channels were filled with CuPc molecules was fabricated.",
author = "H. Kato and S. Takemura and S. Kimura and T. Okumura and D. Kobayakawa and Y. Watanabe and Takeharu Sugiyama and T. Hiramatsu and N. Nanba and O. Nishikawa and M. Taniguchi",
year = "2008",
month = "3",
day = "1",
doi = "10.1088/1742-6596/100/5/052018",
language = "English",
volume = "100",
journal = "Journal of Physics: Conference Series",
issn = "1742-6588",
publisher = "IOP Publishing Ltd.",
number = "PART 5",

}

TY - JOUR

T1 - Nanoscale molecular patterning on artificially fabricated nanoscale structured Al surfaces

AU - Kato, H.

AU - Takemura, S.

AU - Kimura, S.

AU - Okumura, T.

AU - Kobayakawa, D.

AU - Watanabe, Y.

AU - Sugiyama, Takeharu

AU - Hiramatsu, T.

AU - Nanba, N.

AU - Nishikawa, O.

AU - Taniguchi, M.

PY - 2008/3/1

Y1 - 2008/3/1

N2 - The surface of an Al plate was treated with a combination of chemical and electrochemical processes for fabrication of surface nanoscale structures on Al plates. Chemical treatments by using acetone and pure water under supersonic waves were conducted on an Al surface. Additional electrochemical process in H 2 SO 4 solution created a finer and oriented nanoscale structure on the Al surface. DFM measurement clarified that the nanoscale highly oriented line-structure was successfully created on Al surface. The line distance was estimated approximately 30-40 nm. Molecular patterning on the highly oriented line-structure by copper phthalocyanine (CuPc) was also conducted. The CuPc molecules were put on the nanoscale structure by casting a toluene droplet containing CuPc. DFM and X-ray photoemission spectroscopy (XPS) measurements demonstrated that a molecular pattern that the groove channels were filled with CuPc molecules was fabricated.

AB - The surface of an Al plate was treated with a combination of chemical and electrochemical processes for fabrication of surface nanoscale structures on Al plates. Chemical treatments by using acetone and pure water under supersonic waves were conducted on an Al surface. Additional electrochemical process in H 2 SO 4 solution created a finer and oriented nanoscale structure on the Al surface. DFM measurement clarified that the nanoscale highly oriented line-structure was successfully created on Al surface. The line distance was estimated approximately 30-40 nm. Molecular patterning on the highly oriented line-structure by copper phthalocyanine (CuPc) was also conducted. The CuPc molecules were put on the nanoscale structure by casting a toluene droplet containing CuPc. DFM and X-ray photoemission spectroscopy (XPS) measurements demonstrated that a molecular pattern that the groove channels were filled with CuPc molecules was fabricated.

UR - http://www.scopus.com/inward/record.url?scp=77954354354&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77954354354&partnerID=8YFLogxK

U2 - 10.1088/1742-6596/100/5/052018

DO - 10.1088/1742-6596/100/5/052018

M3 - Article

AN - SCOPUS:77954354354

VL - 100

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

SN - 1742-6588

IS - PART 5

M1 - 052018

ER -