Nanostructure characterization of Ni and B layers as artificial pinning centers in multilayered MgB2/Ni and MgB2/B superconducting thin films

H. Sosiati, Satoshi Hata, T. Doi, A. Matsumoto, H. Kitaguchi, Hideharu Nakashima

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Research on the MgB2/Ni and MgB2/B multilayer films fabricated by an electron beam (EB) evaporation technique have been extensively carried out. The critical current density, Jc of MgB2/Ni and MgB2/B multilayer films in parallel fields has been suggested to be higher than that of monolayer MgB2 film due to introducing the artificial pinning centers of nano-sized Ni and B layers. Nanostructure characterization of the artificial pinning centers in the multilayer films were examined by transmission electron microscopy (TEM) and scanning TEM (STEM-energy dispersive X-ray spectroscopy (STEM-EDS))-EDS to understand the mechanism of flux pinning. The growth of columnar MgB2 grains along the film-thickness direction was recognized in the MgB2/Ni multilayer film, but not in the MgB2/B multilayer film. Nano-sized Ni layers were present as crystalline epitaxial layers which is interpreted that Ni atoms might be incorporated into the MgB2 lattice to form (Mg,Ni)B 2 phase. On the other hand, nano-sized B layers were amorphous layers. Crystalline (Mg,Ni)B2 layers worked more effectively than amorphous B-layers, providing higher flux-pinning force that resulted in higher Jc of the MgB2/Ni multilayer film than the MgB 2/B multilayer film.

Original languageEnglish
Pages (from-to)1-8
Number of pages8
JournalPhysica C: Superconductivity and its applications
Volume488
DOIs
Publication statusPublished - May 15 2013

Fingerprint

Superconducting films
Multilayer films
Nanostructures
thin films
Flux pinning
flux pinning
Crystalline materials
Transmission electron microscopy
Epitaxial layers
transmission electron microscopy
Film thickness
Energy dispersive spectroscopy
Electron beams
Monolayers
Evaporation
critical current
film thickness
evaporation
Atoms
electron beams

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Energy Engineering and Power Technology
  • Electrical and Electronic Engineering

Cite this

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abstract = "Research on the MgB2/Ni and MgB2/B multilayer films fabricated by an electron beam (EB) evaporation technique have been extensively carried out. The critical current density, Jc of MgB2/Ni and MgB2/B multilayer films in parallel fields has been suggested to be higher than that of monolayer MgB2 film due to introducing the artificial pinning centers of nano-sized Ni and B layers. Nanostructure characterization of the artificial pinning centers in the multilayer films were examined by transmission electron microscopy (TEM) and scanning TEM (STEM-energy dispersive X-ray spectroscopy (STEM-EDS))-EDS to understand the mechanism of flux pinning. The growth of columnar MgB2 grains along the film-thickness direction was recognized in the MgB2/Ni multilayer film, but not in the MgB2/B multilayer film. Nano-sized Ni layers were present as crystalline epitaxial layers which is interpreted that Ni atoms might be incorporated into the MgB2 lattice to form (Mg,Ni)B 2 phase. On the other hand, nano-sized B layers were amorphous layers. Crystalline (Mg,Ni)B2 layers worked more effectively than amorphous B-layers, providing higher flux-pinning force that resulted in higher Jc of the MgB2/Ni multilayer film than the MgB 2/B multilayer film.",
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T1 - Nanostructure characterization of Ni and B layers as artificial pinning centers in multilayered MgB2/Ni and MgB2/B superconducting thin films

AU - Sosiati, H.

AU - Hata, Satoshi

AU - Doi, T.

AU - Matsumoto, A.

AU - Kitaguchi, H.

AU - Nakashima, Hideharu

PY - 2013/5/15

Y1 - 2013/5/15

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AB - Research on the MgB2/Ni and MgB2/B multilayer films fabricated by an electron beam (EB) evaporation technique have been extensively carried out. The critical current density, Jc of MgB2/Ni and MgB2/B multilayer films in parallel fields has been suggested to be higher than that of monolayer MgB2 film due to introducing the artificial pinning centers of nano-sized Ni and B layers. Nanostructure characterization of the artificial pinning centers in the multilayer films were examined by transmission electron microscopy (TEM) and scanning TEM (STEM-energy dispersive X-ray spectroscopy (STEM-EDS))-EDS to understand the mechanism of flux pinning. The growth of columnar MgB2 grains along the film-thickness direction was recognized in the MgB2/Ni multilayer film, but not in the MgB2/B multilayer film. Nano-sized Ni layers were present as crystalline epitaxial layers which is interpreted that Ni atoms might be incorporated into the MgB2 lattice to form (Mg,Ni)B 2 phase. On the other hand, nano-sized B layers were amorphous layers. Crystalline (Mg,Ni)B2 layers worked more effectively than amorphous B-layers, providing higher flux-pinning force that resulted in higher Jc of the MgB2/Ni multilayer film than the MgB 2/B multilayer film.

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