New photoresist materials for 157-nm lithography. Poly[vinylsulfonyl fluoride-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)-styrene] partially protected with tert-butoxycarbonyl

Tsuyohiko Fujigaya, Yuji Sibasaki, Shinji Ando, Shinji Kishimura, Masayoshi Endo, Masaru Sasago, Mitsuru Ueda

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20 Citations (Scopus)

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Engineering & Materials Science