Novel nanofabrication based on wet nanocoating.(1)- Fabrication of sub-20 nm line array e

Shigenori Fujikawa, Rie Takaki, Toyoki Kunitake

Research output: Contribution to conferencePaperpeer-review

Abstract

We report herein fabrication of arrays of 20 nm silica wall with high aspect ratio via photolithography and the surface sol-gel process. The photolithographycally-fabricated line template on silicon wafer was coated with silica nanolayer by the surface sol-gel process, and the topmost portion of the silica layer and the template was successively removed by CHF3 and oxygen plasma treatment in this order to leave the sidewall of the silica layer on the substrate. The width of as-prepared wall depended on the cycle of the surface sol-gel process, and the thickness of silica wall was only 8 nm at 30 cycles. The height/width ratio of the wall is surprisingly high compared to that of the current lithography processes. The reported method is simple, practical and cost-efficient, and it opens a gateway to further miniaturization of nanostructures.

Original languageEnglish
Number of pages1
Publication statusPublished - 2006
Externally publishedYes
Event55th SPSJ Annual Meeting - Nagoya, Japan
Duration: May 24 2006May 26 2006

Other

Other55th SPSJ Annual Meeting
CountryJapan
CityNagoya
Period5/24/065/26/06

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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