Novel nanofabrication based on wet nanocoating.(3)- Size reduction of nano patterns by etching process

Kentaro Miyoshi, Shigenori Fujikawa, Rie Takaki, Toyoki Kunitake

Research output: Contribution to conferencePaperpeer-review

Abstract

Fabrication of nano materials attracts much attentions for many researchers, because of its unique properties and phenomena. We already succeeded to fabricate silica nano tapes via photolithography and the surface sol-gel process. In detail, the photolithographycally-fabricated line template on silicon wafer was coated with silica nanolayer by the surface sol-gel process. Anisotropic etching by CHF3 and oxygen gas was then applied to leave behind only side wall part of the silica layer, resulting in the formation of nano line, (height: 350nm, width: 8nm) For further miniaturization of those nano lines, the height of the original template pattern was reduced by oxygen plasma, prior to the surface sol-gel process. As a result, we succeeded to prepare height-reduced nano lines. The detachment of the line pattern from the substrate was also studied to form a corresponding nano tape structure.

Original languageEnglish
Number of pages1
Publication statusPublished - 2006
Externally publishedYes
Event55th SPSJ Annual Meeting - Nagoya, Japan
Duration: May 24 2006May 26 2006

Other

Other55th SPSJ Annual Meeting
CountryJapan
CityNagoya
Period5/24/065/26/06

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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