Fabrication of nano materials attracts much attentions for many researchers, because of its unique properties and phenomena. We already succeeded to fabricate silica nano tapes via photolithography and the surface sol-gel process. In detail, the photolithographycally-fabricated line template on silicon wafer was coated with silica nanolayer by the surface sol-gel process. Anisotropic etching by CHF3 and oxygen gas was then applied to leave behind only side wall part of the silica layer, resulting in the formation of nano line, (height: 350nm, width: 8nm) For further miniaturization of those nano lines, the height of the original template pattern was reduced by oxygen plasma, prior to the surface sol-gel process. As a result, we succeeded to prepare height-reduced nano lines. The detachment of the line pattern from the substrate was also studied to form a corresponding nano tape structure.
|Number of pages||1|
|Publication status||Published - 2006|
|Event||55th SPSJ Annual Meeting - Nagoya, Japan|
Duration: May 24 2006 → May 26 2006
|Other||55th SPSJ Annual Meeting|
|Period||5/24/06 → 5/26/06|
All Science Journal Classification (ASJC) codes