Novel phase behavior in adsorbed film of fluoroalkanol and cationic surfactant mixture

K. Shibata, T. Matsuda, R. Fujimoto, H. Matsubara, T. Takiue, M. Aratono

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

The surface tension of the aqueous solution of the binary mixture of 1H,1H-heptafluoro-1-butanol (FC4OH) and dodecyltrimethylammonium bromide (DTAB) was measured as a function of the total molality of the mixture and the composition (mole fraction in the surfactant mixture) of DTAB at 298.15 K under atmospheric pressure to examine the phase behavior in the adsorbed film. The results of the surface tension measurement were analyzed by the thermodynamic procedure proposed by us and the composition of the mixed adsorbed film in equilibrium with their bulk solution was calculated. Three different phases of the adsorbed film appeared by a subtle balance between the attractive interaction of the polar head groups and weak dispersion interaction of the hydrophobic chains. In the low-concentration regime, FC4OH molecules and DTAB molecules form a gaseous film and mix attractively in the whole composition by the long-range ion-dipole attraction between hydrophilic groups. The effect of the attractive dispersion interaction between CH and CF chains became more influential in the expanded film within a restricted composition region, where it should be noted that the interaction between CH and CF is weaker than that between CH chains or between CF chains alone. Furthermore, the adsorbed films at two specific compositions are stabilized by the stoichiometric arrangements of the molecules, which help ion-dipole attraction, in them.

Original languageEnglish
Pages (from-to)443-448
Number of pages6
JournalColloids and Surfaces A: Physicochemical and Engineering Aspects
Volume250
Issue number1-3 SPEC. ISS.
DOIs
Publication statusPublished - Dec 10 2004

All Science Journal Classification (ASJC) codes

  • Surfaces and Interfaces
  • Physical and Theoretical Chemistry
  • Colloid and Surface Chemistry

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