Nucleation-controlled metal-induced lateral crystallization of amorphous Si[1-x]Ge[x] with whole Ge fraction on insulator (Special issue: Active-matrix flatpanel displays and devices: TFT technologies and related materials)

Taizoh Sadoh, Kaoru Toko, Hiroshi Kanno, Shunji Masumori, Masaru Itakura, Noriyuki Kuwano, Masanobu Miyao

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)1876-1879
Number of pages4
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume47
Issue number3
Publication statusPublished - Mar 2008

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