Numerical analysis of oxygen induction thermal plasmas with chemically non-equilibrium assumption for dissociation and ionization

Takayuki Watanabe, Noriaki Sugimoto

Research output: Contribution to journalConference article

19 Citations (Scopus)

Abstract

Modeling of induction thermal plasmas has been performed to investigate a chemically non-equilibrium effect for dissociation and ionization. Computations were carried out for oxygen plasmas under atmospheric pressure. The thermofluid and concentration fields were obtained by solving of two-dimensional modeling. This formulation was presented using higher-order approximation of the Chapman-Enskog method for the estimation of transport properties. A deviation from the equilibrium model indicates that oxygen induction plasmas should be treated as non-equilibrium for dissociation and ionization. The present modeling would give the guidance for the rational design of new material processing using thermal plasmas.

Original languageEnglish
Pages (from-to)201-208
Number of pages8
JournalThin Solid Films
Volume457
Issue number1
DOIs
Publication statusPublished - Jun 1 2004
Externally publishedYes
Event16th Symposium on Plasma Science for Materials (SPSM-16) - Tokyo, Japan
Duration: Jun 4 2003Jun 5 2003

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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