Numerical investigation of a low-electron-temperature ECR plasma in Ar/N2 mixtures

Hiroshi Muta, Mayuko Koga, Naho Itagaki, Yoshinobu Kawai

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

In general, electron temperature is an important plasma parameter which has much influence in the film property. In this paper, the mechanism for decreasing the electron temperature in an electron cyclotron resonance plasma is numerically investigated using a fluid model. A mixture of argon and nitrogen is used as the working gas under the assumption of plasma nitridation. The simulation was carried out with typical magnetic field configurations and various mixture ratios. As a result, it was found that the application of magnetic mirror was suitable for the production of a low-electron-temperature plasma. Besides, the calculation results indicated that the addition of nitrogen was effective to decrease the electron temperature approximately 2 eV due to the vibrational excitation of nitrogen molecules by electron impact.

Original languageEnglish
Pages (from-to)157-161
Number of pages5
JournalSurface and Coatings Technology
Volume171
Issue number1-3
DOIs
Publication statusPublished - Jul 1 2003

Fingerprint

Electron temperature
electron energy
Plasmas
Nitrogen
nitrogen
Magnetic mirrors
magnetic mirrors
magnetic field configurations
Electron cyclotron resonance
Nitridation
Argon
electron cyclotron resonance
electron impact
Gases
argon
Magnetic fields
Molecules
Fluids
Electrons
fluids

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Numerical investigation of a low-electron-temperature ECR plasma in Ar/N2 mixtures. / Muta, Hiroshi; Koga, Mayuko; Itagaki, Naho; Kawai, Yoshinobu.

In: Surface and Coatings Technology, Vol. 171, No. 1-3, 01.07.2003, p. 157-161.

Research output: Contribution to journalArticle

Muta, Hiroshi ; Koga, Mayuko ; Itagaki, Naho ; Kawai, Yoshinobu. / Numerical investigation of a low-electron-temperature ECR plasma in Ar/N2 mixtures. In: Surface and Coatings Technology. 2003 ; Vol. 171, No. 1-3. pp. 157-161.
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